Substrate brush scrubbing and proximity cleaning-drying sequence using compatible chemistries, and method, apparatus, and system for implementing the same
First Claim
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1. A method for cleaning and drying a front and a back surface of a substrate, the method comprising:
- brush scrubbing the back surface of the substrate using a brush scrubbing fluid chemistry;
forming a front meniscus with the front surface of the substrate and a back meniscus with the back surface of the substrate, the forming of the front and the back meniscus being performed after the brush scrubbing of the back surface; and
scanning the front surface of the substrate and the back surface of the substrate with the front and the back meniscus, the front and back meniscus including a chemistry that is compatible with the brush scrubbing fluid chemistry.
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Abstract
A method for cleaning and drying a front and a back surface of a substrate is provided. The method includes brush scrubbing the back surface of the substrate using a brush scrubbing fluid chemistry. The method further includes applying a front meniscus onto the front surface of the substrate upon completing the brush scrubbing of the back surface. The front meniscus includes a front cleaning chemistry that is chemically compatible with the brush scrubbing fluid chemistry.
61 Citations
23 Claims
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1. A method for cleaning and drying a front and a back surface of a substrate, the method comprising:
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brush scrubbing the back surface of the substrate using a brush scrubbing fluid chemistry;
forming a front meniscus with the front surface of the substrate and a back meniscus with the back surface of the substrate, the forming of the front and the back meniscus being performed after the brush scrubbing of the back surface; and
scanning the front surface of the substrate and the back surface of the substrate with the front and the back meniscus, the front and back meniscus including a chemistry that is compatible with the brush scrubbing fluid chemistry. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. A method for cleaning and drying a front and a back surface of a substrate, the method comprising:
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brush scrubbing the back surface of the substrate using a brush scrubbing fluid chemistry; and
upon completing the brush scrubbing of the back surface, applying a front meniscus onto the front surface of the substrate, the front meniscus including a front cleaning chemistry, the front cleaning chemistry being chemically compatible with the brush scrubbing fluid chemistry. - View Dependent Claims (11, 12, 13, 14, 15, 16)
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17. A substrate preparation system, the system comprising:
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a brush configured to brush scrub a back surface of a substrate using a brush scrubbing chemistry;
a front head defined in close proximity to a front surface of the substrate; and
a back head defined in close proximity to the back surface of the substrate, the back head being positioned substantially opposite to the front head, wherein the front head and the back head are applied as a pair to the substrate when the brush is apart from the substrate. - View Dependent Claims (18, 19, 20, 21, 22, 23)
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Specification