Light-emitting device and method of fabricating the same
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Accused Products
Abstract
A light-emitting device having a structure in which a mask used for forming a film such as an organic compound layer does not come in contact with the pixels in forming the light-emitting elements, and a method of fabricating the same. In fabricating the light-emitting device of the active matrix type, a partitioning wall constituted by a second wiring and a separation portion is formed on the interlayer-insulating film, and the pixels are surrounded by the partitioning wall, preventing the mask from coming into direct contact with the pixels, the mask being used for forming the organic compound layer and the opposing electrode of the light-emitting elements.
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Citations
108 Claims
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1-81. -81. (canceled)
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82. A display device comprising:
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a TFT over a substrate;
a light-emitting element over the substrate, the light-emitting element comprising a first electrode, a light-emitting layer and a second electrode;
a first wiring electrically connected to the first electrode;
an insulating film provided over the first wiring; and
a second wiring provided over the first wiring and over the insulating film, wherein the second wiring is electrically connected to the TFT and the first wiring. - View Dependent Claims (83, 84, 85, 86, 87)
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88. A display device comprising:
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a TFT over a substrate;
a light-emitting element over the substrate, the light-emitting element comprising a first electrode, a light-emitting layer and a second electrode;
a first wiring electrically connected to the first electrode;
an insulating film provided over the first wiring;
a second wiring provided over the first wiring and over the insulating film, wherein the second wiring is electrically connected to the TFT and the first wiring; and
a separation portion provided over the second wiring. - View Dependent Claims (89, 90, 91, 92, 93, 94, 95)
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96. A method of fabricating a display device comprising:
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forming a source region, a drain region and a channel region over a substrate;
forming a gate insulating film over the source region, the drain region and the channel region;
forming a gate electrode and a first wiring;
forming an insulating film over the gate electrode and over the first wiring;
removing part of the insulating film formed over the first wiring;
forming a second wiring over the first wiring and over the insulating film, wherein the second wiring is electrically connected to one of the source region and the drain region;
forming a separation portion over the second wiring; and
forming a light-emitting element electrically connected to the first wiring. - View Dependent Claims (97, 98, 99)
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100. A method of fabricating a display device comprising:
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forming a source region, a drain region and a channel region over a substrate;
forming a gate insulating film over the source region, the drain region and the channel region;
forming a gate electrode and a first wiring;
forming an insulating film over the gate electrode and over the first wiring;
removing part of the insulating film formed over the first wiring;
forming a second wiring over the first wiring and over the insulating film, wherein the second wiring is electrically connected to one of the source region and the drain region;
forming a separation portion over the second wiring; and
forming a first electrode, a light-emitting layer and a second electrode of a light-emitting element by using the separation portion as a mask. - View Dependent Claims (101, 102, 103, 104)
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105. A method of fabricating a display device comprising:
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forming a source region, a drain region and a channel region over a substrate;
forming a gate insulating film over the source region, the drain region and the channel region;
forming a gate electrode and a first wiring;
forming a first insulating film over the gate electrode and over the first wiring;
removing part of the first insulating film formed over the first wiring;
forming a second wiring over the first wiring and over the first insulating film, wherein the second wiring is electrically connected to one of the source region and the drain region;
forming a second insulating film over the second wiring; and
forming a partitioning wall by etching the second wiring and the second insulating film. - View Dependent Claims (106, 107, 108)
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Specification