Optical scanning using vibratory diffraction gratings
First Claim
1. A vibratory mechanical structure, comprising:
- a mass platform;
at least one support structure connected to the mass platform through at least one flexural structure;
at least one diffraction grating patterned on the mass platform; and
at least one driving actuator.
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Accused Products
Abstract
An optical scanning apparatus includes an in-plane vibratory mass platform having at least one diffraction grating formed thereon as the scanning element, at least one flexure structure that connects the mass platform to at least one fixed support, and at least one driving actuator that drives the mass platform into an in-plane vibratory motion which can be rotational and/or translational. The apparatus may also be formed by a mass platform having at least one diffraction grating formed thereon as the scanning element, at least one driving actuator connected to the mass platform through at least one flexure structure. The driving actuator drives the mass platform into an in-plane vibratory motion.
97 Citations
50 Claims
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1. A vibratory mechanical structure, comprising:
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a mass platform;
at least one support structure connected to the mass platform through at least one flexural structure;
at least one diffraction grating patterned on the mass platform; and
at least one driving actuator. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17)
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18. A vibratory-mechanical structure, comprising:
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a mass platform;
a first support connected to the mass platform through a first flexural structure;
a second support connected to the mass platform through a second flexural structure, the second support and second flexural structure attaching to the mass platform at a 180°
angle to the first support and first flexural structure;
a first comb drive attached to the mass platform at a 90°
angle from the first support and flexural structure; and
a second comb drive attached to the mass platform at a 270°
angle from the first support and flexural structure. - View Dependent Claims (19, 20, 21, 22, 23, 24)
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25. A vibratory-mechanical structure, comprising:
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a mass platform;
a support connected to the mass platform through a flexural structure; and
a comb drive having a movable electrode having a movable electrode formed on the flexural structure and at least one fixed electrode attached to a substrate. - View Dependent Claims (26, 27)
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28. A vibratory-mechanical structure, comprising:
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a mass platform; and
a comb drive resonator connected to the mass platform through a flexural structure. - View Dependent Claims (29, 30, 31, 32, 33)
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34. A vibratory-mechanical structure, comprising:
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a mass platform; and
a parallel-plate electrostatic actuator connected to the mass platform through a flexural structure. - View Dependent Claims (35, 36, 37, 38, 39)
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40. A vibratory-mechanical structure, comprising:
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a mass platform;
a first comb drive resonator connected to the mass platform through a first flexural structure; and
a second comb drive resonator connected to the mass platform through a second flexural structure, wherein the second flexural structure is connected to the platform at a 180°
angle to the first flexural structure. - View Dependent Claims (41, 42, 43)
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44. A vibratory-mechanical structure, comprising:
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a mass platform;
a first comb drive resonator connected to the mass platform through a first flexural structure;
a second comb drive resonator connected to the mass platform through a second flexural structure, wherein the second flexural structure is connected to the mass platform at a 120°
angle to the first flexural structure; and
a third comb drive resonator connected to the mass platform through a third flexural structure, wherein the third flexural structure is connected to the mass platform at a 240°
angle to the first flexural structure. - View Dependent Claims (45, 46, 47)
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48. A method for forming a vibratory-mechanical diffraction grating, comprising:
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providing a silicon-on-insulator wafer;
forming a photoresist layer over the wafer;
forming a grating pattern in the photoresist;
transferring the grating pattern to the wafer using RIE;
forming a second layer of photoresist over the wafer;
forming a first pattern in the photoresist followed by DRIE etching;
forming a second patterned under the wafer followed by DRIE etching; and
etching exposed SiO2 to release the grating'"'"'s structure. - View Dependent Claims (49, 50)
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Specification