Ion sensitive field effect transistor (ISFET) sensor with improved gate configuration
First Claim
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1. An ion sensitive field effect transistor (ISFET) comprising:
- a substrate having a sensing region;
a layer of silicon oxide (SiO2) disposed over the sensing region of the substrate;
a barrier layer of alumina disposed over the layer of silicon oxide;
a tantalum oxide (Ta2O5) sensing membrane disposed over the barrier layer, and being configured for exposure to a solution.
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Abstract
An ion sensitive field effect transistor pH sensor is provided with an improved sensor gate configuration. Specifically, a tantalum oxide-sensing gate is disposed on top of an alumina layer. The tantalum oxide-sensing gate provides advantageous sensitivity, while the alumina barrier layer increases sensor longevity in situations where the sensor is exposed to caustic cleaning processes such as Clean In Place processes.
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6 Claims
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1. An ion sensitive field effect transistor (ISFET) comprising:
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a substrate having a sensing region;
a layer of silicon oxide (SiO2) disposed over the sensing region of the substrate;
a barrier layer of alumina disposed over the layer of silicon oxide;
a tantalum oxide (Ta2O5) sensing membrane disposed over the barrier layer, and being configured for exposure to a solution. - View Dependent Claims (2, 3, 4, 5)
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6. A method of sensing ions with an ISFET, the method comprising:
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contacting a tantalum oxide sensing membrane of the ISFET with a sample solution;
allowing ions in the sample solution to interact electrically with the sensing layer;
providing an alumina barrier layer proximate the sensing layer; and
measuring a drain current of the ISFET.
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Specification