Measurement and compensation of errors in interferometers
First Claim
1. A method for determining the location of an alignment mark on a stage using an interferometry system, the method comprising:
- measuring a location, x1, of a stage along a first measurement axis using the interferometry system;
measuring a location, x2, of the stage along a second measurement axis; and
determining a location of the alignment mark along a third axis based on x1, x2, and a correction term, ψ
3, calculated from predetermined information comprising information characterizing imperfections in the interferometry system determined using the interferometry system and the stage.
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Abstract
In general, in one aspect, the invention features a method for determining the location of an alignment mark on a stage including measuring a location, x1, of a stage along a first measurement axis using an interferometry system, measuring a location, x2, of the stage along a second measurement axis parallel to the first measurement axis, and determining a location of the alignment mark along a third axis parallel to the first measurement axis based on x1, x2, and a correction term, ψ3, calculated from predetermined information including information characterizing imperfections in the interferometry system determined using the interferometry system and the stage.
77 Citations
48 Claims
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1. A method for determining the location of an alignment mark on a stage using an interferometry system, the method comprising:
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measuring a location, x1, of a stage along a first measurement axis using the interferometry system;
measuring a location, x2, of the stage along a second measurement axis; and
determining a location of the alignment mark along a third axis based on x1, x2, and a correction term, ψ
3, calculated from predetermined information comprising information characterizing imperfections in the interferometry system determined using the interferometry system and the stage. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 40, 41, 42, 43, 44, 45, 48)
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19. A method, comprising:
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monitoring the location of a stage along a first measurement axis using an interferometry system while scanning the stage along one or more paths;
monitoring the location of the state along a second measurement axis non-parallel to the first measurement axis using the interferometry system while scanning the stage along the one or more paths; and
determining information related to imperfections in the interferometry system based on the monitored locations. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 29, 30, 31, 32, 33)
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28. The method of 27, wherein the interferometer is used to monitor the location of the stage along the first measurement axis.
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34. An interferometry system, comprising:
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an interferometer configured to monitor a location, xi, of a stage along a first axis; and
an electronic controller coupled to the interferometer, wherein during operation the electronic controller determines a location of the stage along a third axis based on x1, a location, x2, of the stage along a second axis and a correction term, ψ
3, calculated from predetermined information comprising information characterizing imperfections in the interferometry system determined using the interferometry system and the stage. - View Dependent Claims (35, 37, 38, 39, 46, 47)
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36. An interferometry system, comprising:
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a first interferometer configured to monitor the location of a stage along a first measurement axis;
a second interferometer configured to monitor the location of the stage along a second measurement axis non-parallel to the first measurement axis; and
an electronic controller coupled to the first and second interferometers and configured to monitor the location of the stage along the first and second measurement axes while the stage is scanned along one or more paths, and to determine information related to imperfections in the interferometry system based on the monitored locations.
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Specification