Enhanced lithographic resolution through double exposure
First Claim
1. A method of enhancing the image resolution in a lithographic system, comprising:
- decomposing a reticle pattern into at least two constituent sub-patterns;
coating a substrate with a pre-specified photoresist layer, said pre-specified photoresist layer having reduced memory reaction characteristics;
exposing a first of said at least two constituent sub-patterns by directing a projection beam through said first sub-pattern such that said lithographic system produces a first sub-pattern image onto said pre-specified photoresist layer of said substrate;
processing said exposed substrate;
exposing a second of said at least two constituent sub-patterns by directing said projection beam through said second sub-pattern such that said lithographic system produces a second sub-pattern image onto said pre-specified photoresist layer of said substrate, wherein said exposing combines said first and second sub-pattern images to produce a desired pattern on said substrate.
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Accused Products
Abstract
A system and method for enhancing the image resolution in a lithographic system, is presented herein. The invention comprises decomposing a reticle pattern into at least two constituent sub-patterns that are capable of being optically resolved by the lithographic system, coating a substrate with a pre-specified photoresist layer, and exposing a first of the at least two constituent sub-patterns by directing a projection beam through the first sub-pattern such that the lithographic system produces a first sub-pattern image onto the pre-specified photoresist layer of the substrate. The invention further comprises processing the exposed substrate, exposing a second of the at least two constituent sub-patterns by directing the projection beam through the second sub-pattern such that the lithographic system produces a second sub-pattern image onto the pre-specified photoresist layer of the substrate, and then combining the first and second sub-pattern images to produce a desired pattern on the substrate.
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Citations
32 Claims
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1. A method of enhancing the image resolution in a lithographic system, comprising:
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decomposing a reticle pattern into at least two constituent sub-patterns;
coating a substrate with a pre-specified photoresist layer, said pre-specified photoresist layer having reduced memory reaction characteristics;
exposing a first of said at least two constituent sub-patterns by directing a projection beam through said first sub-pattern such that said lithographic system produces a first sub-pattern image onto said pre-specified photoresist layer of said substrate;
processing said exposed substrate;
exposing a second of said at least two constituent sub-patterns by directing said projection beam through said second sub-pattern such that said lithographic system produces a second sub-pattern image onto said pre-specified photoresist layer of said substrate, wherein said exposing combines said first and second sub-pattern images to produce a desired pattern on said substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An enhanced image resolution lithographic system, comprising:
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a coating station configured to apply a photoresist layer onto a substrate, said photoresist layer configured to exhibit reduced memory reaction characteristics;
an exposure apparatus to expose a reticle pattern onto said substrate; and
a processing station configured to process a substrate exposed by said exposure apparatus, wherein said reticle pattern is decomposed into at least two constituent sub-patterns that can be optically resolved by said exposure apparatus, wherein a first of said at least two constituent sub-patterns is exposed onto said substrate by said exposure apparatus to produce a first sub-pattern image onto said photoresist layer of said substrate and said exposed substrate is processed by said processing station, and wherein a second of said at least two constituent sub-patterns is exposed onto said substrate by said exposure apparatus to produce a second sub-pattern image onto said photoresist layer of said substrate and said first and second sub-pattern images are combined to reproduce said reticle pattern. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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23. A device manufacturing method comprising:
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providing a substrate coated with a photoresist layer having reduced memory reaction characteristics;
providing a beam radiation;
employing a patterning device to impart said beam of radiation with a pattern in its cross-section in which said pattern is decomposed into at least two constituent sub-patterns;
exposing a first of said at least two constituent sub-patterns by directing said beam of radiation beam through said first sub-pattern such that said lithographic system produces a first sub-pattern image onto said pre-specified photoresist layer of said substrate;
processing said exposed substrate;
exposing a second of said at least two constituent sub-patterns by directing said beam of radiation through said second sub-pattern such that said lithographic system produces a second sub-pattern image onto said pre-specified photoresist layer of said substrate, wherein said exposing combines said first and second sub-pattern images to produce a desired pattern on said substrate. - View Dependent Claims (24, 25, 26, 27, 28, 29, 30, 31, 32)
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Specification