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Mask blank manufacturing method and sputtering target for manufacturing the same

  • US 20050170263A1
  • Filed: 01/06/2005
  • Published: 08/04/2005
  • Est. Priority Date: 01/07/2004
  • Status: Active Grant
First Claim
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1. A method of manufacturing a mask blank having a thin film for forming a mask pattern on a substrate, wherein said thin film is formed by a sputtering method using a sputtering target of which target member and backing plate are bonded to each other with a bonding agent, and further wherein a metal film is formed on a side wall of the sputtering target so as to prevent the bonding agent from being exposed.

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