Laser annealing apparatus and annealing method of semiconductor thin film using the same
First Claim
1. A laser annealing apparatus comprising:
- a stage for moving a substrate mounted thereon in two directions crossing each other at right angles;
a laser oscillator for oscillating a laser beam;
a beam shaper for shaping said laser beam into a long and narrow shape;
an imaging lens disposed in a positional relationship such that said laser beam shaped into said long and narrow shape is projected onto said substrate mounted on said stage; and
a unit for rotating said laser beam shaped into said long and narrow shape around an optical axis of said laser beam.
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Accused Products
Abstract
A laser beam temporally modulated in amplitude by a modulator and shaped into a long and narrow shape by a beam shaper is rotated around the optical axis of an image rotator inserted between the beam shaper and a substrate. Thus, the longitudinal direction of the laser beam having the long and narrow shape is rotated around the optical axis on the substrate. In order to perform annealing in a plurality of directions on the substrate, the laser beam shaped into the long and narrow shape is rotated on the substrate while a stage mounted with the substrate is moved only in two directions, that is, X- and Y-directions. In such a manner, the substrate can be scanned at a high speed with a continuous wave laser beam modulated temporally in amplitude and shaped into a long and narrow shape, without rotating the substrate. Thus, a semiconductor film can be annealed.
82 Citations
14 Claims
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1. A laser annealing apparatus comprising:
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a stage for moving a substrate mounted thereon in two directions crossing each other at right angles;
a laser oscillator for oscillating a laser beam;
a beam shaper for shaping said laser beam into a long and narrow shape;
an imaging lens disposed in a positional relationship such that said laser beam shaped into said long and narrow shape is projected onto said substrate mounted on said stage; and
a unit for rotating said laser beam shaped into said long and narrow shape around an optical axis of said laser beam. - View Dependent Claims (3, 5, 7, 9, 11)
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2. A laser annealing apparatus comprising:
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a stage for moving a substrate mounted thereon in two directions crossing each other at right angles;
a laser oscillator for oscillating a laser beam;
a beam shaper for shaping said laser beam into a long and narrow shape;
a relay lens for converting said laser beam shaped into said long and narrow shape to a collimated beam;
an imaging lens disposed in a positional relationship such that said collimated laser beam is projected onto said substrate mounted on said stage in a state where said laser beam has been shaped into said long and narrow shape; and
a unit for rotating said laser beam shaped into said long and narrow shape around an optical axis of said laser beam. - View Dependent Claims (4, 6, 8, 10)
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12. A laser annealing method comprising the steps of:
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mounting a substrate on a stage, said substrate having an amorphous silicon film or a polycrystalline silicon film formed in one principal surface thereof; and
scanning a desired region of said amorphous silicon film or said polycrystalline silicon film on said substrate while irradiating said desired region with a laser beam shaped into a long and narrow shape;
wherein in order to scan said substrate with said laser beam in a plurality of directions, said laser beam shaped into said long and narrow shape is rotated around an optical axis of said laser beam without rotating said substrate, while said stage mounted with said substrate is moved only in two directions crossing each other at right angles, so that said desired region can be irradiated at any position and in any direction with said laser beam shaped into said long and narrow shape. - View Dependent Claims (13, 14)
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Specification