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Laser annealing apparatus and annealing method of semiconductor thin film using the same

  • US 20050170572A1
  • Filed: 11/15/2004
  • Published: 08/04/2005
  • Est. Priority Date: 01/30/2004
  • Status: Active Grant
First Claim
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1. A laser annealing apparatus comprising:

  • a stage for moving a substrate mounted thereon in two directions crossing each other at right angles;

    a laser oscillator for oscillating a laser beam;

    a beam shaper for shaping said laser beam into a long and narrow shape;

    an imaging lens disposed in a positional relationship such that said laser beam shaped into said long and narrow shape is projected onto said substrate mounted on said stage; and

    a unit for rotating said laser beam shaped into said long and narrow shape around an optical axis of said laser beam.

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