Plasma processing device
First Claim
1. A plasma processing apparatus comprising:
- a chamber for carrying out plasma processing inside;
a top plate made of a dielectric material for sealing the upper side of said chamber; and
high frequency supplying means for supplying high frequency waves into said chamber via said top plate, wherein said top plate has wave reflecting means inside for reflecting high frequency waves that propagate inside said top plate.
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Accused Products
Abstract
A plasma processing apparatus includes a chamber for carrying out plasma processing inside, a top plate made of a dielectric material for sealing the upper side of this chamber, and an antenna section that serves as a high frequency supply for supplying high frequency waves into the chamber via this top plate. The top plate is provided with reflecting members inside thereof. The sidewalls of the reflecting members work as a wave reflector for reflecting high frequency waves that propagate inside the top plate in the radius direction. Alternatively, no reflecting members may be provided in a manner in which the sidewalls of a recess of the top plate serve as a wave reflector.
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Citations
15 Claims
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1. A plasma processing apparatus comprising:
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a chamber for carrying out plasma processing inside;
a top plate made of a dielectric material for sealing the upper side of said chamber; and
high frequency supplying means for supplying high frequency waves into said chamber via said top plate, wherein said top plate has wave reflecting means inside for reflecting high frequency waves that propagate inside said top plate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A plasma processing apparatus comprising:
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a chamber for carrying out plasma processing inside;
a top plate made of a dielectric material for sealing the upper side of said chamber;
high frequency supplying means for supplying high frequency waves into said chamber via said top plate; and
an antenna plate having a slot provided between said top plate and said high frequency supplying means, wherein said top plate has a thick portion and a thin portion so that said slot is placed in a position that corresponds to said thin portion.
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Specification