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Plasma processing device

  • US 20050172901A1
  • Filed: 05/30/2003
  • Published: 08/11/2005
  • Est. Priority Date: 06/06/2002
  • Status: Active Grant
First Claim
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1. A plasma processing apparatus comprising:

  • a chamber for carrying out plasma processing inside;

    a top plate made of a dielectric material for sealing the upper side of said chamber; and

    high frequency supplying means for supplying high frequency waves into said chamber via said top plate, wherein said top plate has wave reflecting means inside for reflecting high frequency waves that propagate inside said top plate.

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