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Corrosion-inhibiting cleaning compositions for metal layers and patterns on semiconductor substrates

  • US 20050176604A1
  • Filed: 12/23/2004
  • Published: 08/11/2005
  • Est. Priority Date: 02/10/2004
  • Status: Abandoned Application
First Claim
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1. A corrosion-inhibiting cleaning composition for semiconductor wafer processing, comprising an aqueous admixture of at least water, a surfactant and a corrosion-inhibiting compound selected from a group consisting of amino phosphonates, polyamines and polycarboxylic acids.

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