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System and method of CVD chamber cleaning

  • US 20050178333A1
  • Filed: 02/18/2004
  • Published: 08/18/2005
  • Est. Priority Date: 02/18/2004
  • Status: Abandoned Application
First Claim
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1. A thin-film deposition system comprising:

  • a plasma CVD reactor;

    a remote plasma chamber arranged outside the plasma CVD reactor, for providing active species to an interior of the plasma CVD; and

    an electromagnetic wave generator arranged outside the plasma CVD reactor and the remote plasma chamber, for emitting electromagnetic waves to the interior of the reactor.

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