Semiconductor integrated circuits with stacked node contact structures and methods of fabricating such devices
First Claim
1. An integrated circuit comprising:
- a first transistor having first and second impurity regions formed at a semiconductor substrate;
a first interlayer insulating layer on the first transistor;
a second transistor having first and second impurity regions on the first interlayer insulating layer opposite the first transistor;
a second interlayer insulating layer on the second transistor opposite the first interlayer insulating layer;
a third transistor having first and second impurity regions on the second interlayer insulating layer opposite the second transistor;
a third interlayer insulating layer on the third transistor opposite the second interlayer insulating layer; and
a node plug penetrating the first, second and third interlayer insulating layers to electrically connect the first impurity region of the first transistor, the first impurity region of the second transistor and the first impurity region of third transistor to one another.
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Accused Products
Abstract
Semiconductor integrated circuits that include thin film transistors (TFTs) and methods of fabricating such semiconductor integrated circuits are provided. The semiconductor integrated circuits may include a bulk transistor formed at a semiconductor substrate and a first interlayer insulating layer on the bulk transistor. A lower TFT may be on the first interlayer insulating layer, and a second interlayer insulating layer may be on the lower TFT. An upper TFT may be on the second interlayer insulating layer, and a third interlayer insulating layer may be on the upper TFT. A first impurity region of the bulk transistor, a first impurity region of the lower TFT, and a first impurity region of the upper TFT may be electrically connected to one another through a node plug that penetrates the first, second and third interlayer insulating layers.
54 Citations
72 Claims
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1. An integrated circuit comprising:
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a first transistor having first and second impurity regions formed at a semiconductor substrate;
a first interlayer insulating layer on the first transistor;
a second transistor having first and second impurity regions on the first interlayer insulating layer opposite the first transistor;
a second interlayer insulating layer on the second transistor opposite the first interlayer insulating layer;
a third transistor having first and second impurity regions on the second interlayer insulating layer opposite the second transistor;
a third interlayer insulating layer on the third transistor opposite the second interlayer insulating layer; and
a node plug penetrating the first, second and third interlayer insulating layers to electrically connect the first impurity region of the first transistor, the first impurity region of the second transistor and the first impurity region of third transistor to one another. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A static random access memory (SRAM) cell comprising:
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a first bulk transistor having a first impurity region formed at least partially in a semiconductor substrate;
a second bulk transistor having a first impurity region formed at least partially in the semiconductor substrate;
a first interlayer insulating layer on the first and second bulk transistors;
a first lower thin film transistor having a first impurity region on the first interlayer insulating layer;
a second lower thin film transistor having a first impurity region on the first interlayer insulating layer;
a second interlayer insulating layer on the first and second lower thin film transistors;
a first upper thin film transistor having a first impurity region on the second interlayer insulating layer;
a second upper thin film transistor having a first impurity region on the second interlayer insulating layer;
a third interlayer insulating layer on the first and second upper thin film transistors;
a first node plug penetrating the first, second and third interlayer insulating layers to electrically connect the first impurity region of the first bulk transistor, the first impurity region of the first lower thin film transistor and the first impurity region of the first upper thin film transistor to one another; and
a second node plug penetrating the first, second and third interlayer insulating layers to electrically connect the first impurity region of the second bulk transistor, the first impurity region of the second lower thin film transistor and the first impurity region of the second upper thin film transistor to one another. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31)
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32. A static random access memory (SRAM) cell comprising:
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an isolation layer in a semiconductor substrate that defines first and second active regions;
a first bulk transistor and a second bulk transistor at least partially in the first and second active regions, respectively;
a first interlayer insulating layer on the first and second bulk transistors;
a first single crystalline lower body pattern and a second single crystalline lower body pattern on the first interlayer insulating layer;
a first lower thin film transistor and a second lower thin film transistor at the first and second lower body patterns, respectively;
a second interlayer insulating layer on the first and second lower thin film transistors;
a first single crystalline upper body pattern and a second single crystalline upper body pattern on the second interlayer insulating layer;
a first upper thin film transistor and a second upper thin film transistor at the first and second upper body patterns, respectively;
a third interlayer insulating layer on the first and second upper thin film transistors;
a first node plug penetrating the first, second and third interlayer insulating layers to electrically connect a first impurity region of the first bulk transistor, a first impurity region of the first lower thin film transistor and a first impurity region of the first upper thin film transistor to one another; and
a second node plug penetrating the first, second and third interlayer insulating layers to electrically connect a first impurity region of the second bulk transistor, a first impurity region of the second lower thin film transistor and a first impurity region of the second upper thin film transistor to one another. - View Dependent Claims (33, 34, 35, 36, 37, 38, 39, 40, 41, 42, 43, 44)
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45-70. -70. (canceled)
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71. A method of fabricating an integrated circuit, the method comprising:
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forming a first transistor having first and second impurity regions at a semiconductor substrate;
forming a first interlayer insulating layer on the first transistor;
forming a second transistor having first and second impurity regions on the first interlayer insulating layer opposite the first transistor;
forming a second interlayer insulating layer on the second transistor opposite the first interlayer insulating layer;
forming a third transistor having first and second impurity regions on the second interlayer insulating layer opposite the second transistor;
forming a third interlayer insulating layer on the third transistor opposite the second interlayer insulating layer; and
forming a node plug that penetrates the first, second and third interlayer insulating layers to electrically connect the first impurity region of the first transistor, the first impurity region of the second transistor and the first impurity region of third transistor to one another.
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72-81. -81. (canceled)
Specification