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Lithographic apparatus and device manufacturing method

  • US 20050179882A1
  • Filed: 02/18/2004
  • Published: 08/18/2005
  • Est. Priority Date: 02/18/2004
  • Status: Active Grant
First Claim
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1. A lithographic apparatus comprising:

  • an illumination system for supplying a projection beam of radiation;

    an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section;

    a substrate table for supporting a substrate; and

    a projection system for projecting the patterned beam onto a target portion of the substrate, wherein the projection system includes an array of focusing elements, arranged such that each focusing element directs the radiation in the patterned beam from a plurality of the individually controllable elements to thereby expose an area of the substrate.

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