Lithographic apparatus and device manufacturing method
First Claim
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1. A lithographic apparatus comprising:
- an illumination system for supplying a projection beam of radiation;
an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section;
a substrate table for supporting a substrate; and
a projection system for projecting the patterned beam onto a target portion of the substrate, wherein the projection system includes an array of focusing elements, arranged such that each focusing element directs the radiation in the patterned beam from a plurality of the individually controllable elements to thereby expose an area of the substrate.
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Abstract
Provided is a method and system for facilitating use of a plurality of individually controllable elements to modulate the intensity of radiation received at each focusing element of an array of focusing elements to control the intensity of the radiation in the areas on the substrate onto which the focusing elements direct the radiation.
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Citations
12 Claims
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1. A lithographic apparatus comprising:
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an illumination system for supplying a projection beam of radiation;
an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section;
a substrate table for supporting a substrate; and
a projection system for projecting the patterned beam onto a target portion of the substrate, wherein the projection system includes an array of focusing elements, arranged such that each focusing element directs the radiation in the patterned beam from a plurality of the individually controllable elements to thereby expose an area of the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A device manufacturing method comprising the steps of:
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providing a projection beam of radiation using an illumination system;
using an array of individually controllable elements to impart the projection beam with a pattern in its cross-section; and
using an array of focusing elements as part of a projection system to project the patterned beam onto a target portion of the substrate, wherein each of the focusing elements is arranged to direct radiation in the patterned beam from a plurality of the individually controllable elements onto an area within the target portion, and wherein the individually controllable elements are set to a plurality of different states, in each of which a different intensity of radiation propagates from the individually controllable element to the associated focusing element; and
setting each of the individually controllable elements to produce a desired intensity of radiation at said areas on the substrate. - View Dependent Claims (10, 11, 12)
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Specification