Objective with pupil obscuration
First Claim
1. A projection exposure apparatus comprising:
- an illuminating system to illuminate a drivable micromirror array and an objective, which projects said drivable micromirror array onto photosensitive substrate;
wherein said objective comprises mirrors which are arranged coaxial with respect to a common optical axis.
1 Assignment
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Accused Products
Abstract
An objective is configured with a first partial objective and a second partial objective. The first partial objective, which projects a first field plane onto an intermediate image, has a first, convex mirror and a second, concave mirror. The second partial objective, which projects the intermediate image onto a second field plane, has a third and a fourth mirror, both concave. All of the four mirrors have central mirror apertures. The axial distance between the first and second mirrors is in a ratio between 0.95 and 1.05 relative to the distance between the second mirror and the intermediate image. The axial distance ZM3-IM between the third mirror and the second field plane conforms to the relationship
NA represents the numerical aperture NA in the second field plane, and DUM3 represents the diameter of the third mirror. The objective furthermore has a Petzval radius with an absolute value larger than the distance between the first and second field planes.
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Citations
21 Claims
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1. A projection exposure apparatus comprising:
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an illuminating system to illuminate a drivable micromirror array and an objective, which projects said drivable micromirror array onto photosensitive substrate;
wherein said objective comprises mirrors which are arranged coaxial with respect to a common optical axis. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A projection exposure apparatus comprising:
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an illuminating system to illuminate a drivable micromirror array and an objective, which projects said drivable mircromirror array onto a photosensitive substrate;
wherein said objective is catoptric objective with an imaging scale ratio of greater than 20;
1. - View Dependent Claims (16)
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17. A projection exposure apparatus comprising:
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an illuminating system to illuminate a drivable micromirror array and an objective, which projects said drivable micromirror array onto photosensitive substrate;
wherein said objective comprises at least two partial objectives with an intermediate image plane between said at least two partial objectives. - View Dependent Claims (18, 19)
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20. A projection exposure apparatus comprising:
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an illuminating system to illuminate a drivable micromirror array and an objective, which projects said drivable micromirror array onto a photosensitive substrate;
wherein said objective is an objective with pupil obscuration.
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21. A projection exposure apparatus comprising:
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an illuminating system to illuminate a drivable micromirror array and an objective, which projects said drivable micromirror array onto a photosensitive substrate;
wherein said objective consists of mirrors being coated with reflecting layers which are adapted to reflect two mutually separated operating wavelengths.
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Specification