Method for improved lithographic patterning utilizing multiple coherency optimized exposures and high transmission attenuated PSM
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Abstract
A method for optically transferring a lithographic pattern corresponding to an integrated circuit utilizing a high transmission attenuated phase-shift mask onto a semiconductor substrate by use of an optical exposure tool. The method comprising the steps of generating a diffraction pattern corresponding to the lithographic pattern, where the diffraction pattern indicates a plurality of spatial frequency components corresponding to the lithographic pattern; determining which of the spatial frequency components need to be captured by a lens in the optical exposure tool in order to accurately reproduce the lithographic pattern; determining a set of illumination conditions required for the optical exposure tool to capture the spatial frequency components necessary for accurately reproducing the lithographic pattern; and illuminating the high transmission attenuated phase-shift mask with this set of illumination conditions.
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Citations
21 Claims
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1-8. -8. (canceled)
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9. A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to control an optical exposure tool for optically transferring a lithographic pattern corresponding to an integrated circuit utilizing a high transmission attenuated phase-shift mask onto a semiconductor substrate by use of an optical exposure tool, the transfer method comprising the steps of
generating a diffraction pattern corresponding to said lithographic pattern, said diffraction pattern indicating a plurality of spatial frequency components corresponding to said lithographic pattern; -
determining which of said spatial frequency components need to be captured by a lens in said optical exposure tool in order to accurately reproduce said lithographic pattern;
determining a set of illumination conditions required for said optical exposure tool to capture said spatial frequency components necessary for accurately reproducing said lithographic pattern; and
illuminating said a high transmission attenuated phase-shift mask with said set of said illumination conditions. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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17-19. -19. (canceled)
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20. A computer program product for controlling a computer comprising a recording medium readable by the computer, means recorded on the recording medium for directing the computer to generate files corresponding to a mask utilized in the process of optically transferring a lithographic pattern corresponding to an integrated circuit onto a semiconductor substrate by use of an optical exposure tool, the transfer method comprising the steps of:
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generating a diffraction pattern corresponding to a lithographic pattern to be imaged, said diffraction pattern indicating a plurality of spatial frequency components corresponding to said lithographic pattern;
determining which of said spatial frequency components need to be captured by a lens in an optical exposure tool in order to accurately reproduce said lithographic pattern; and
forming a reticle having a pattern which allows said spatial frequency components to be captured to be imaged on a substrate. - View Dependent Claims (21)
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Specification