Lithographic apparatus and device manufacturing method

• US 20050190353A1
• Filed: 02/27/2004
• Published: 09/01/2005
• Est. Priority Date: 02/27/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Holding NV
• Inventors: de Jager, Pieter Willem Herman, Gui, Cheng-Qun
• Granted Patent: US 7,081,947 B2
• Time in Patent Office: Days
• US Class Current: 355/55
• CPC Class Codes: G03F 7/7025 Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70791 Large workpieces, e.g. glass substrates for flat panel displays or solar panels
• CPC Class Codes: G03F 7/70816 Bearings
• CPC Class Codes: G03F 7/70825 Mounting of individual elements, e.g. mounts, holders or supports workpiece or mask holders G03F7/707
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Abstract

An arrangement for adjusting the position on a substrate of a patterned beam generated by a light engine relative to the substrate. The arrangement moves an array of focusing elements, each of which focuses a portion of the patterned beam onto a point on the substrate, relative to an array of individually controllable elements to impart the pattern to the patterned beam.

Claims

1. A lithographic apparatus, comprising:

an illumination system that supplies a projection beam of radiation;

an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section;

a substrate table that supports a substrate;

a projection system that projects the patterned beam onto a target portion of the substrate, the projection system including an array of focusing elements, each of the focusing elements projecting part of the patterned beam onto part of the target portion of the substrate; and

an actuator system that moves the array of focusing elements relative to the array of individually controllable elements.

2. The lithographic apparatus according to claim 1, wherein the focusing elements move relative to the array of individually controllable elements in at least one of a first direction substantially parallel to the face of the substrate on which the patterned beam is incident, a second direction perpendicular to the first direction and substantially parallel to the face of the substrate on which the patterned beam is incident, a third direction substantially perpendicular to the face of the substrate on which the patterned beam is incident and rotationally about one or more axes substantially parallel to the first, second and third directions.

3. The lithographic apparatus according to claim 1, wherein the array of focusing elements includes a radiation blocking layer located between the focusing elements, the radiation blocking layer preventing radiation within the patterned beam that is not incident on the focusing elements from reaching the substrate.

4. The lithographic apparatus according to claim 1, wherein the apparatus further comprises:

a second array of individually controllable elements serving to impart a second projection beam with a pattern in its cross-section; and

a second projection system that projects the second patterned beam onto a second target portion of the substrate, the second projection system including a second array of focusing elements,

wherein each of the second array of focusing elements projects part of the second patterned beam onto part of the second target portion of the substrate,

wherein the actuator system that moves the first array of focusing elements also moves the first array of focusing elements relative to the second array of focusing elements.

5. The lithographic apparatus according to claim 4, wherein the apparatus further comprises:

a second actuator system for moving the second array of focusing elements relative to the second array of individually controllable elements.

6. The lithographic apparatus according to claim 5, wherein the second array of focusing elements move relative to the second array of individually controllable elements in at least one of a first direction substantially parallel to the face of the substrate on which the second patterned beam is incident, a second direction perpendicular to the first direction and substantially parallel to the face of the substrate on which the second patterned beam is incident, a third direction substantially perpendicular to the face of the substrate on which the second patterned beam is incident, and rotationally about one or more axes substantially parallel to the first, second and third directions.

7. The lithographic apparatus according to claim 5, wherein the apparatus further comprises:

a reference frame; and

first and second actuator systems that are mounted to the reference frame, such that the first and second actuator systems move the first and second arrays of focusing elements, respectively, relative to the reference frame.

8. The lithographic apparatus according to claim 7, wherein the first and second arrays of individually controllable elements are mounted to the reference frame.

9. The lithographic apparatus according to claim 7, wherein the elements of the first and second projection systems, other than the arrays of focusing elements, are mounted to the reference frame.

10. A lithographic apparatus comprising:

an illumination system that supplies a projection beam of radiation;

an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section;

a substrate table that supports a substrate;

a projection system that projects the patterned beam onto a target portion of the substrate;

a second array of individually controllable elements serving to impart a second projection beam with a pattern in its cross-section;

a second projection system that projects the second patterned beam onto a second target portion of the substrate; and

an actuator system for moving the first array of individually controllable elements and the first projection system relative to the second array of individually controllable elements and the second projection system,

wherein the position of the first array of individually controllable elements is fixed relative to the position of the first projection system,

wherein the position of the second array of individually controllable elements is fixed relative to the position of the second projection system.

11. The lithographic apparatus according to claim 10, wherein the first array of individually controllable elements and the first projection system move relative to the second array of individually controllable elements and second projection system in at least one of a first direction substantially parallel to the face of the substrate on which the patterned beams are incident, a second direction perpendicular to the first direction and substantially parallel to the face of the substrate on which the patterned beams are incident, a third direction, substantially perpendicular to the face of the substrate on which the patterned beams are incident, and rotationally about one or more axes substantially parallel to the first, second and third directions.

12. The lithographic apparatus according to claim 10, further comprising:

a first reference frame, wherein the first array of individually controllable elements and the first projection system are fixed to the first reference frame; and

a second reference frame, wherein the second array of individually controllable elements and the second projection system are fixed to the second reference frame,

wherein the actuator system is mounted to operate between the first and second reference frames.

13. The lithographic apparatus according to claim 12, further comprising:

a third reference frame to which the substrate table is mounted, wherein the first reference frame is mounted to the third reference frame and wherein the first actuator system controls the relative positions of the first and third reference frames; and

a second actuator system, wherein the second reference frame is mounted to the third reference frame and wherein the second actuator system controls the relative positions of the second and third reference frames.

14. A device manufacturing method, comprising:

providing a substrate;

providing a projection beam of radiation using an illumination system;

using an array of individually controllable elements to impart the projection beam with a pattern in its cross-section;

projecting the patterned beam of radiation onto a target portion of the substrate using a projection system, the projection system including an array of focusing elements;

using each of the focusing elements to project part of the patterned beam onto part of the target portion of the substrate; and

adjusting the position of the array of focusing elements relative to the array of individually controllable elements.

15. A device manufacturing method, comprising:

providing a substrate;

providing a projection beam of radiation using an illumination system;

using an array of individually controllable elements to impart the projection beam with a pattern in its cross-section; and

projecting the patterned beam of radiation onto a target portion of the substrate,

providing a second projection beam of radiation;

using a second array of individually controllable elements to impart the second projection beam with a pattern in its cross-section;

projecting the second patterned beam onto a second target portion of the substrate;

using an actuator system to control the position of the first array of individually controllable elements and a first projection system relative to the second array of individually controllable elements and a second projection system;

using the first projection system to project the first patterned beam onto the substrate; and

using the second projection system to project the second patterned beam onto the substrate.