Article coated with zirconium compound film, method for preparing the article and sputtering target for use in coating with the film
First Claim
1. An article coated with a zirconium compound film wherein a zirconium target containing a metal of which the sputtering yield in an argon atmosphere is more than twice that of zirconium used when the zirconium compound film is formed and deposited by a reactive sputtering process on a substrate.
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Abstract
A method for forming a zirconium compound film on a substrate by a sputtering process using a zirconium target which contains a metal (such as tin or zinc) of which the sputtering yield in an argon atmosphere is more than twice that of zirconium in place of a conventional metallic zirconium target. An article coated with the zirconium compound film and a sputtering target used for coating the film are provided. It is desirable that the content of the metal be 1-45 at %, but a third metal can be added thereto.
14 Citations
13 Claims
- 1. An article coated with a zirconium compound film wherein a zirconium target containing a metal of which the sputtering yield in an argon atmosphere is more than twice that of zirconium used when the zirconium compound film is formed and deposited by a reactive sputtering process on a substrate.
- 3. The article coated with a zirconium compound film containing a metal of which the sputtering yield in an argon atmosphere is more than twice that of zirconium.
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