Metallization process and product produced thereby

• US 20050196604A1
• Filed: 03/05/2004
• Published: 09/08/2005
• Est. Priority Date: 03/05/2004
• Status: Abandoned Application

• Current Assignee: Unifoil Corporation
• Original Assignee: Unifoil Corporation
• Inventors: Funicelli, Joseph, Gallino, Robert
• Application Number:
  US10/794,382
• Publication Number:
  US 20050196604A1
• Time in Patent Office: Days
• US Class Current: 428/323
• CPC Class Codes: B44C 1/1737 Decalcomanias provided with a particular decorative layer, e.g. specially adapted to allow the formation of a metallic or dyestuff on a substrate unsuitable for direct deposition
• CPC Class Codes: Y10T 428/24612 Composite web or sheet
• CPC Class Codes: Y10T 428/24917 including metal layer
• CPC Class Codes: Y10T 428/25 Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
• CPC Class Codes: Y10T 428/26 Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
• CPC Class Codes: Y10T 428/265 1 mil or less
• CPC Class Codes: Y10T 428/31507 Of polycarbonate
• CPC Class Codes: Y10T 428/31678 Of metal
• CPC Class Codes: Y10T 428/31681 Next to polyester, polyamide or polyimide [e.g., alkyd, glue, or nylon, etc.]
• CPC Class Codes: Y10T 428/31692 Next to addition polymer from unsaturated monomers
• CPC Class Codes: Y10T 442/3382 Including a free metal or alloy constituent
• CPC Class Codes: Y10T 442/654 Including a free metal or alloy constituent

Abstract

A layered structure produced by metallizing a substrate including: (a) providing a transfer film including film layer and metal layer bonded together by a cured breakaway layer; (b) providing a substrate; (c) applying electron beam curable transfer adhesive to a portion of the substrate; (d) securing the transfer film to the substrate, where the transfer adhesive is between the metal layer and substrate, forming an intermediate product; (e) passing the intermediate product through an electron beam curing apparatus to cure the transfer adhesive; and (f) removing the transfer film. In the metallized product, the cured breakaway coating is bonded only to the metal. The cured breakaway layer preferably has a cured elongation at break, in tension, of less than about 20%. Precise metallized edges are produced, e.g., edge variation of about ±0.010 in., or better. The process can be utilized with total or selective metal transfer.

Claims

1. A layered structure comprising at least one each of:

(a) a substrate layer;

(b) a metal-containing layer;

(c) an adhesive-containing layer adhering said metal in said metal-containing layer to said substrate layer; and

(d) a breakaway layer, having a top surface and a bottom surface, said bottom surface of said breakaway layer coating substantially only said metal of said metal-containing layer, and said breakaway layer having a cured elongation at break when tested in tension of less than about 20%.

2. The structure of claim 1 wherein said metal-containing layer comprises a metal selected from the group consisting of gold;

platinum;

silver;

aluminum;

zinc;

copper;

nickel;

tin;

silicon; and

alloys and mixtures thereof.

3. The structure of claim 1 wherein the metal in said metal-containing layer has a thickness selected from the group consisting of about 20 Å

to about 1000 Å

;

about 30 Å

to about 800 Å

;

about 40 Å

to about 600 Å

;

about 50 Å

to about 400 Å

;

about 55 Å

to about 300 Å

; and

about 60 Å

to about 200 Å

.

4. The structure of claim 1 wherein the metal in said metal-containing layer has a thickness of about 25 Å

to about 150 Å

.

5. The structure of claim 1 wherein said substrate layer comprises a polymer selected from the group consisting of paper made from natural pulp, synthetic pulp or mixtures thereof;

polypropylene;

polyethylene;

polyester;

polycarbonate;

acrylic;

polyimide;

polyvinylchloride;

polystyrene;

cellophane;

polyethylene terephthalate;

ethylene vinylacetate copolymer;

ethylene vinylalcohol;

polyacrylonitrile;

cellulose acetate butyrate;

polyamide;

polyvinylalcohol;

polyalanide;

polyimide;

polyurethane;

polymethylmethacrylate;

polylactic acid;

polycaprolactone;

Kevlar;

Nomex;

Tedlar;

Teflon;

Tyvek; and

mixtures thereof.

6. The structure of claim 5 wherein said substrate layer is in a form selected from the group consisting of board, sheet, film, woven fabric and non-woven fabric.

7. The structure of claim 5 wherein said substrate layer further comprises at least one additive selected from the group consisting of fillers, dyes and pigments.

8. The structure of claim 1 wherein said adhesive comprises at least one component selected from the group consisting of urethane acrylate resin;

epoxy acrylate resin;

polyester acrylate resin;

mono- di-, tri-, or tetra-hexacrylate resin; and

mixtures thereof.

9. The structure of claim 8 wherein said adhesive further comprises at least one additive selected from the group consisting of fillers, dyes and pigments.

10. The structure of claim 1 wherein said adhesive-containing layer is cured by electron beam radiation.

11. The structure of claim 1 wherein said breakaway layer comprises at least one cured oligomer or polymer component selected from the group consisting of acrylates;

urethane acrylates;

epoxy acrylates;

polyester acrylates;

mono- di-, tri-, or tetra-hexacrylate;

acrylate acrylics aliphatic polyurethanes;

aromatic polyurethanes;

polyesters;

cellulose derivatives;

cellulose acetate;

cellulose acetate butyrate;

nitrocellulose;

acrylics; and

mixtures thereof.

12. The structure of claim 11 wherein said breakaway layer further comprises at least one additive selected from the group consisting of fillers, dyes and pigments.

13. The structure of claim 1 wherein said top surface of said breakaway layer includes a surface finish selected from the group consisting of a mirror finish;

a matte finish;

a hairline pattern finish;

an embossed pattern finish;

a hologram pattern finish; and

mixtures thereof.

14. The structure of claim 1 including printed matter disposed on said top surface of said breakaway layer.

15. The structure of claim 14 wherein said printed matter is applied by a method selected from the group consisting of offset, rotogravure, flexographic, letterpress and silk screen.

28. The structure of claim 1, having a scuff resistance of about 50 to about 150 rubs face to face as measured using a 4 lb. weight utilizing the Sutherland Rub Tester.

29. The structure of claim 1, having has a scuff resistance of about 0.1% to about 2.0% weight loss, based on the total sample weight, using the Taber Abraider Tester.

30. The structure of claim 1, having a hardness of about 25 to about 75 on the Sward Hardness scale.

31. The structure of claim 1, having a hardness of about 50 to about 105 on the Konig Hardness Scale.

32. The structure of claim 1, having a bond strength such that less than about wt. 2% of the top surface of said finished product is removed following adhesive contact with No. 600, 3M Scotch brand adhesive tape at an extension rate of about 1 ft./min.

33. The structure of claim 1, wherein said top surface of said breakaway coating has a dyne level of about 32 to about 58 dynes/cm.

34. The structure of claim 1, exhibiting acceptable discoloration after about 40 to about 60 hours exposure in an Atlas Fadeometer test.

35. The structure of claim 1, exhibiting less than about 10% loss in functionality after exposure in a Weatherometer test for about 80 hours.

16. A method of metallizing a substrate comprising the steps of:

(a) providing a transfer film comprising a film layer and a metal layer bonded together by a cured breakaway layer, said breakaway layer having a cured elongation at break when tested in tension of less than about 20%;

(b) providing a substrate;

(c) applying an electron beam curable transfer adhesive to at least a portion of said substrate;

(d) securing said transfer film to said substrate comprising said transfer adhesive such that said transfer adhesive is disposed between said metal layer and said substrate to form an intermediate product;

(e) passing said intermediate product through an electron beam curing apparatus to cure said transfer adhesive;

(f) removing said transfer film from said intermediate product to provide a metallized substrate product.

17. The method of claim 16, including applying said transfer adhesive selectively to only portions of said substrate, whereby said metallized substrate product includes metal-containing portions in said metal layer and said breakaway coating layer bonded thereto only in said portions of said substrate.

18. The method of claim 16, wherein said substrate is selected from the group consisting of paper made from natural pulp, synthetic pulp or mixtures thereof;

polypropylene;

polyethylene;

polyester;

polycarbonate;

acrylic;

polyimide;

polyvinylchloride;

polystyrene;

cellophane;

polyethylene terephthalate;

ethylene vinylacetate copolymer;

ethylene vinylalcohol;

polyacrylonitrile;

cellulose acetate butyrate;

polyamide;

polyvinylalcohol;

polyalanide;

polyimide;

polyurethane;

polymethylmethacrylate;

polylactic acid;

polycaprolactone;

Kevlar;

Nomex;

Tedlar;

Teflon;

Tyvek; and

mixtures thereof.

19. The method of claim 16, wherein said substrate comprises credit card stock.

20. The method of claim 16 including using said metallized substrate product to prepare an article of manufacture selected from the group consisting of credit cards, bankcards, phone cards, trading cards, licenses, containers, wrapping materials, displays, and signs.

21. The method of claim 20 including using said metallized substrate product to prepare said container for use with a product selected from the group consisting of foods, cosmetics, drugs, smoking products, toys, electronics, kitchen utensils, glassware, hardware, sporting goods, wearable items, and bottled goods.

22. The method of claim 16, including applying said electron beam curable adhesive substantially free of water or non-curable volatile organic solvents or diluents.

23. The method of claim 16, including applying said transfer adhesive to selective areas of said substrate.

24. The method of claim 16 wherein said breakaway coating is cured by a method selected from the group consisting of radiation or thermal energy.

25. The method of claim 24 including curing said breakaway coating by electron beam radiation.

26. The method of claim 24 including curing said breakaway coating by thermal energy.

27. The method of claim 16 including providing a transfer film having a metal layer having an optical density of greater than about 1.5.

36. A method of selectively metallizing a substrate comprising the steps of:

(a) providing a transfer film comprising a film layer and a metal layer bonded together by a breakaway layer, said breakaway layer having a cured elongation at break when tested in tension of less than about 20%;

(b) providing a substrate;

(c) applying an electron beam curable transfer adhesive to selective areas of said substrate in order to form a selective adhesive layer;

(d) securing said transfer film to said substrate such that said transfer adhesive is between said metal layer and said substrate thereby forming an intermediate product;

(e) exposing said intermediate product to electron beam radiation to substantially cure said transfer adhesive; and

(f) removing said film layer from said intermediate product to provide a selectively metallized substrate product wherein said metal and said breakaway layer bonded thereto, and said selectively applied transfer adhesive layer are in substantial registration.

37. The method of claim 36 including curing said breakaway coating by a method selected from the group consisting of radiation or thermal energy.

38. The method of claim 37 including curing said breakaway coating by electron beam radiation.

39. The method of claim 37 including curing said breakaway coating by thermal energy.

40. The method of claim 36 including providing a transfer film having a metal layer having an optical density of greater than about 1.5.

41. A method of metallizing a substrate to provide precisely metallized edges comprising the steps of:

(a) providing a transfer film comprising a film layer and a metal layer bonded together by a breakaway layer, said breakaway layer having a cured elongation at break when tested in tension of less than about 20%;

(b) providing a substrate;

(c) applying an electron beam curable transfer adhesive to at least a portion of said substrate wherein said portion includes at least one edge;

(d) securing said transfer film to said substrate comprising said transfer adhesive such that said transfer adhesive is disposed between said metal layer and said substrate to form an intermediate product;

(e) exposing said intermediate product to electron beam radiation to substantially cure said transfer adhesive;

(f) removing said transfer film from said intermediate product to provide a metallized product having at least one metallized edge, said metallized edge varying from a line drawn along said edge and mid-way through the variations from said line by less than or equal to about ±

0.010 inches.

42. The method of claim 41 wherein said variation is less than or equal to about ±

0.0010 inches.

43. A method of selectively metallizing a substrate to provide sharply or precisely metallized edges comprising the steps of:

(a) providing a transfer film comprising a film layer and a metal layer bonded together by a breakaway layer, said breakaway layer having a cured elongation at break when tested in tension of less than about 20%;

(b) providing a substrate;

(c) applying an electron beam curable transfer adhesive selectively to at least two areas of said substrate in order to form a selective adhesive layer;

(d) securing said transfer film to said substrate such that said transfer adhesive is between said metal layer and said substrate thereby forming an intermediate product;

(e) exposing said intermediate product to electron beam radiation to substantially cure said transfer adhesive; and

(f) removing said film layer from said intermediate product to provide a metallized product having at least two selectively metallized areas, each said area comprising at least one metallized edge, said edges separated from one another by a non-metallized area, the distance between adjoining edges of said selectively metallized areas differing by less than or equal to about ±

0.010 inches.

44. The method of claim 43 wherein said difference is less than or equal to about ±

0.0010 inches.

45. A method for selectively metallizing a polymer-containing substrate comprising:

(a) providing a transfer film from a transfer film roll, wherein said transfer film comprises a film layer and a metal layer bonded together by a breakaway coating layer, wherein said breakaway layer has a cured elongation at break when tested in tension of less than about 20%;

(b) providing a polymer-containing substrate;

(c) selectively applying an electron beam curable transfer adhesive to portions of said substrate in order to form a selective adhesive layer thereon;

(d) bringing into contact said metal layer of said transfer film and said selective adhesive layer of said substrate, thereby forming an intermediate product;

(e) exposing said intermediate product to electron beam radiation to substantially cure said selectively applied transfer adhesive; and

,

(f) removing said film layer from said intermediate product to provide a selectively metallized product comprising said metal layer in substantial registration with said selectively applied transfer adhesive.

46. The method of claim 45 including curing said breakaway coating by a method selected from the group consisting of radiation or thermal energy.

47. The method of claim 46 including curing said breakaway coating by electron beam radiation.

48. The method of claim 46 including curing said breakaway coating by thermal energy.

49. The method of claim 45 including providing a transfer film having a metal layer having an optical density of greater than about 1.5.

50. A transfer film comprising a film layer and a metal layer bonded together by a cured breakaway coating layer having a top surface in contact with said transfer film and a bottom surface in contact with said metal layer, wherein said breakaway layer has a cured elongation at break when tested in tension of less than about 20%.

51. The transfer film of claim 50 wherein said film layer comprises a polymer film.

52. The transfer film of claim 51 wherein said metal layer has a thickness of about 30 Å

to about 800 Å and

comprises a metal selected from the group consisting of gold;

platinum;

silver;

aluminum;

zinc;

copper;

nickel;

tin;

silicon; and

alloys and mixtures thereof.

53. The transfer film of claim 50 wherein said breakaway layer comprises at least one cured oligomer or polymer component selected from the group consisting of acrylates;

urethane acrylates;

epoxy acrylates;

polyester acrylates;

mono- di-, tri-, or tetra-hexacrylate;

acrylate acrylics aliphatic polyurethanes;

aromatic polyurethanes;

polyesters;

cellulose derivatives;

cellulose acetate;

cellulose acetate butyrate;

nitrocellulose;

acrylics; and

mixtures thereof.

54. The transfer film of claim 50 wherein said breakaway coating is cured by electron beam radiation.

55. The transfer film of claim 50 wherein said breakaway coating is cured by thermal energy.

56. The transfer film of claim 50 wherein the top surface of said breakaway coating has a dyne level of about 32 to about 58 dynes/cm.

57. The transfer film of claim 50 wherein said metal layer has an optical density of greater than about 1.5.

58. A selectively metallized layered structure comprising at least one each of:

(a) a substrate layer;

(b) a metal-containing layer comprising selectively metallized portions;

(c) an adhesive layer adhering said selectively metallized portions of said metal-containing metal layer to said substrate layer; and

(d) a breakaway layer, having a top surface and a bottom surface, said bottom surface of said breakaway layer coating said selectively metallized portions of said metal-containing layer, and said breakaway layer having cured elongation at break when tested in tension of less than about 20%.

59. The selectively metallized layered structure of claim 58 having at least two selectively metallized areas, each said area having at least one metallized edge, said edges separated from one another by a non-metallized area, thereby providing adjoining metallized edges.

60. The selectively metallized layered structure of claim 59 wherein the distance between said adjoining metallized edges varies by less than or equal to about ±

0.010 inches.

61. The selectively metallized layered structure of claim 60 wherein said distance varies by less than or equal to about ±

0.0010 inches.

62. A layered structure comprising at least one each of:

(a) a substrate layer;

(b) a metal-containing layer;

(c) a radiation curable adhesive layer adhering said metal of said metal-containing layer to said substrate layer; and

(d) a radiation curable breakaway layer, having a top surface and a bottom surface, said bottom surface of said breakaway layer coating said metal of said metal-containing layer, and said top surface of said breakaway layer dyne level of about 34 to about 58 dynes/cm.

63. A layered structure comprising at least one each of:

(a) a substrate layer;

(b) a metal-containing layer;

(c) a radiation curable adhesive layer adhering said metal of said metal-containing layer to said substrate layer; and

(d) a radiation curable breakaway layer, having a top surface and a bottom surface, said bottom surface of said breakaway layer coating said metal of said metal-containing layer, said breakaway layer having a cured elongation at break when tested in tension of about 100% to about 300%.

64. The layered structure of claim 63 wherein said breakaway layer of about 34 to about 58 dynes/cm.

65. The layered structure of claim 63 wherein said cured elongation is about 100% to about 200%.

66. The layered structure of claim 65 wherein said cured elongation is about 105% to about 175%.

67. A method of metallizing a substrate comprising the steps of:

(a) providing a transfer film comprising a film layer and a metal layer bonded together by a radiation cured breakaway layer, said breakaway layer having a top surface and a bottom surface, said top surface in contact with said film layer;

(b) providing a substrate having a top surface and a bottom surface;

(c) applying an electron beam curable transfer adhesive to substantially all of said substrate top surface;

(d) securing said transfer film to said substrate top surface comprising said transfer adhesive such that said transfer adhesive is disposed between said metal present in said metal layer and said substrate to form an intermediate product;

(e) passing said intermediate product through an electron beam curing apparatus to cure said transfer adhesive;

(f) removing said transfer film from said intermediate product in order to transfer substantially all of said metal present in transfer film so as to provide a metallized product.

68. The method of claim 67 wherein said breakaway layer is cured using electron beam radiation.

69. The method of claim 67 wherein said metal layer has an optical density of greater than about 1.5.

70. The method of claim 67 wherein said metal layer is about 60 Å

to about 200 Å

.

71. The method of claim 67 wherein said breakaway layer exhibits a dyne level of about 34 to about 58 dynes/cm.

72. A layered structure comprising at least one each of:

(a) a substrate layer;

(b) a metal-containing layer;

(c) an adhesive-containing layer adhering said metal in said metal-containing layer to said substrate layer; and

(d) a breakaway layer, having a top surface and a bottom surface, said bottom surface of said breakaway layer coating substantially only said metal of said metal-containing layer.

73. The structure of claim 72 wherein said metal-containing layer comprises a metal selected from the group consisting of gold;

platinum;

silver;

aluminum;

zinc;

copper;

nickel;

tin;

silicon; and

alloys and mixtures thereof.

74. The structure of claim 72 wherein the metal in said metal-containing layer has a thickness of about 30 Å

to about 800 Å

.

75. The structure of claim 72 wherein the metal in said metal-containing layer has a thickness of about 25 Å

to about 150 Å

.

76. The structure of claim 72 wherein said substrate layer comprises a polymer selected from the group consisting of paper made from natural pulp, synthetic pulp or mixtures thereof;

polypropylene;

polyethylene;

polyester;

polycarbonate;

acrylic;

polyimide;

acrylic;

polyimide;

polyvinylchloride;

polystyrene;

cellophane;

polyethylene terephthalate;

ethylene vinylacetate copolymer;

ethylene vinylalcohol;

polyacrylonitrile;

cellulose acetate butyrate;

polyamide;

polyvinylalcohol;

polyalanide;

polyimide;

polyurethane;

polymethylmethacrylate;

polylactic acid;

polycaprolactone;

Kevlar;

Nomex;

Tedlar;

Teflon;

Tyvek; and

mixtures thereof.

77. The structure of claim 76 wherein said substrate layer is in a form selected from the group consisting of board, sheet, film, woven fabric and non-woven fabric.

78. The structure of claim 76 wherein said substrate layer further comprises at least one additive selected from the group consisting of fillers, dyes and pigments.

79. The structure of claim 72 wherein said adhesive comprises at least one component selected from the group consisting of urethane acrylate resin;

epoxy acrylate resin;

polyester acrylate resin;

mono- di-, tri-, or tetra-hexacrylate resin; and

mixtures thereof.

80. The structure of claim 79 wherein said adhesive further comprises at least one additive selected from the group consisting of fillers, dyes and pigments.

81. The structure of claim 72 wherein the adhesive in said adhesive-containing layer is cured by electron beam radiation.

82. The structure of claim 72 wherein said breakaway layer comprises at least one cured oligomer or polymer component selected from the group consisting of acrylates;

urethane acrylates;

epoxy acrylates;

polyester acrylates;

mono- di-, tri-, or tetra-hexacrylate;

acrylate acrylics aliphatic polyurethanes;

aromatic polyurethanes;

polyesters;

cellulose derivatives;

cellulose acetate;

cellulose acetate butyrate;

nitrocellulose;

acrylics; and

mixtures thereof.

83. The structure of claim 82 wherein said breakaway layer further comprises at least one additive selected from the group consisting of fillers, dyes and pigments.

84. The structure of claim 72 wherein said top surface of said breakaway layer includes a surface finish selected from the group consisting of a mirror finish;

a matte finish;

a hairline pattern finish;

an embossed pattern finish;

a hologram pattern finish; and

mixtures thereof.

85. The structure of claim 72 including printed matter disposed on said top surface of said breakaway layer.

86. The structure of claim 85 wherein said printed matter is applied by a method selected from the group consisting of offset, rotogravure, flexographic, letterpress and silk screen.

87. The structure of claim 72, having a scuff resistance of about 50 to about 150 rubs face to face as measured using a 4 lb. weight utilizing the Sutherland Rub Tester.

88. The structure of claim 72, having has a scuff resistance of about 0.1% to about 2.0% weight loss, based on the total sample weight, using the Taber Abraider Tester.

89. The structure of claim 72, having a hardness of about 25 to about 75 on the Sward Hardness scale.

90. The structure of claim 72, having a hardness of about 50 to about 105 on the Konig Hardness Scale.

91. The structure of claim 72, having a bond strength such that less than about wt. 2% of the top surface of said finished product is removed following adhesive contact with No. 600, 3M Scotch brand adhesive tape at an extension rate of about 1 ft./min.

92. The structure of claim 72, wherein the top surface of said breakaway coating has a dyne level of about 32 to about 58 dynes/cm.

93. The structure of claim 72, exhibiting acceptable discoloration after about 40 to about 60 hours exposure in an Atlas Fadeometer test.

94. The structure of claim 72, exhibiting less than about 10% loss in functionality after exposure in a Weatherometer test for about 80 hours.

95. A selectively metallized layered structure comprising at least one each of:

(a) a substrate layer;

(b) a metal-containing layer comprising selectively metallized portions;

(c) an adhesive layer adhering said selectively metallized portions of said metal-containing metal layer to said substrate layer; and

(d) a breakaway layer, having a top surface and a bottom surface, said bottom surface of said breakaway layer coating said selectively metallized portions of said metal-containing layer.

96. The selectively metallized layered structure of claim 95 having at least two selectively metallized portions, each said portion having at least one metallized edge, said edges separated from one another by a non-metallized portion, thereby providing adjoining metallized edges.

97. The selectively metallized layered structure of claim 96 wherein the distance between said adjoining metallized edges varies by less than or equal to about ±

0.010 inches.

98. The selectively metallized layered structure of claim 97 wherein said distance varies by less than or equal to about ±

0.0010 inches.

99. A layered structure comprising at least one each of:

(a) a substrate layer;

(b) a metal-containing layer;

(c) a radiation curable adhesive layer adhering said metal of said metal-containing layer to said substrate layer; and

(d) a radiation curable breakaway layer, having a top surface and a bottom surface, said bottom surface of said breakaway layer coating said metal of said metal-containing layer, and said top surface of said breakaway layer exhibiting a dyne level of about 34 to about 58 dynes/cm.

100. A layered structure comprising at least one each of:

(a) a substrate layer;

(b) a metal-containing layer;

(c) a radiation curable adhesive layer adhering said metal of said metal-containing layer to said substrate layer; and

(d) a radiation curable breakaway layer, having a top surface and a bottom surface, said bottom surface of said breakaway layer coating said metal of said metal-containing layer, said breakaway layer having a cured elongation at break when tested in tension of about 100% to about 300%.

101. The structure of claim 100 wherein said breakaway layer exhibits a dyne level of about 34 to about 58 dynes/cm.

102. The structure of claim 100 wherein said cured elongation is about 100% to about 200%.

103. The structure of claim 102 wherein said cured elongation is about 105% to about 175%.

104. The structure of claim 100 wherein the metal in said metal-containing layer has an optical density of greater than about 1.5.

105. A method of metallizing a substrate comprising the steps of:

(a) providing a transfer film comprising a film layer and a metal layer bonded together by a cured breakaway layer;

(b) providing a substrate;

(c) applying an electron beam curable transfer adhesive to at least a portion of said substrate;

(d) securing said transfer film to said substrate comprising said transfer adhesive such that said transfer adhesive is disposed between said metal layer and said substrate to form an intermediate product;

(e) passing said intermediate product through an electron beam curing apparatus to cure said transfer adhesive;

(f) removing said transfer film from said intermediate product to provide a metallized substrate product having a cured breakaway layer bonded to said metal layer at said transfer adhesive portion.

106. The method of claim 105, including applying said transfer adhesive selectively to said substrate.

107. The method of claim 105, wherein said substrate is selected from the group consisting of paper made from natural pulp, synthetic pulp or mixtures thereof;

polypropylene;

polyethylene;

polyester;

polycarbonate;

acrylic;

polyimide;

polyvinylchloride;

polystyrene;

cellophane;

polyethylene terephthalate;

ethylene vinylacetate copolymer;

ethylene vinylalcohol;

polyacrylonitrile;

cellulose acetate butyrate;

polyamide;

polyvinylalcohol;

polyalanide;

polyimide;

polyurethane;

polymethylmethacrylate;

polylactic acid;

polycaprolactone;

Kevlar;

Nomex;

Tedlar;

Teflon;

Tyvek; and

mixtures thereof.

108. The method of claim 105, wherein said substrate comprises credit card stock.

109. The method of claim 105 including using said metallized substrate product to prepare an article of manufacture selected from the group consisting of credit cards, bankcards, phone cards, trading cards, licenses, containers, wrapping materials, displays, and signs.

110. The method of claim 109 including using said metallized substrate product to prepare said container for use with a product selected from the group consisting of foods, cosmetics, drugs, smoking products, toys, electronics, kitchen utensils, glassware, hardware, sporting goods, wearable items, and bottled goods.

111. The method of claim 105, including applying said electron beam curable adhesive substantially free of water or non-curable volatile organic solvents or diluents.

112. The method of claim 105 wherein said breakaway coating is cured by a method selected from the group consisting of radiation or thermal energy.

113. The method of claim 112 including curing said breakaway coating by electron beam radiation.

114. The method of claim 112 including curing said breakaway coating by thermal energy.

115. The method of claim 105 including providing a transfer film having a metal layer having an optical density of greater than about 1.5.

116. The method of claim 105 including providing a breakaway layer having a cured elongation at break when tested in tension of less than about 20%.

117. The method of claim 116 wherein said metallized substrate product has at least one metallized edge, said metallized edge varying from a line drawn along said edge and mid-way through the variations from said line by less than or equal to about ±

0.010 inches.

118. The method of claim 117 wherein said variation is less than or equal to about ±

0.0010 inches.

119. A method of selectively metallizing a substrate comprising the steps of:

(a) providing a transfer film comprising a film layer and a metal layer bonded together by a breakaway layer;

(b) providing a substrate;

(c) applying an electron beam curable transfer adhesive to selective areas of said substrate in order to form a selective adhesive layer;

(d) securing said transfer film to said substrate such that said transfer adhesive is between said metal layer and said substrate thereby forming an intermediate product;

(e) exposing said intermediate product to electron beam radiation to substantially cure said transfer adhesive; and

(f) removing said film layer from said intermediate product to provide a selectively metallized substrate product wherein said metal and said breakaway layer bonded thereto, and said selectively applied cured transfer adhesive layer are in substantial registration.

120. The method of claim 119 including curing said breakaway coating by a method selected from the group consisting of radiation or thermal energy.

121. The method of claim 120 including curing said breakaway coating by electron beam radiation.

122. The method of claim 120 including curing said breakaway coating by thermal energy.

123. The method of claim 119 including providing a transfer film having a metal layer having an optical density of greater than about 1.5.

124. The method of claim 119 including applying said transfer adhesive to at least two areas of said substrate layer.

125. The method of claim 124 to provide a metallized product having at least two selectively metallized areas, each said area comprising at least one metallized edge, said edges separated from one another by a non-metallized area, the distance between adjoining edges of said selectively metallized areas differing by less than or equal to about ±

0.010 inches.

126. The method of claim 125 wherein said difference is less than or equal to about ±

0.0010 inches.

127. The method of claim 119, wherein said substrate is selected from the group consisting of paper made from natural pulp, synthetic pulp or mixtures thereof;

polypropylene;

polyethylene;

polyester;

polycarbonate;

acrylic;

polyimide;

polyvinylchloride;

polystyrene;

cellophane;

polyethylene terephthalate;

ethylene vinylacetate copolymer;

ethylene vinylalcohol;

polyacrylonitrile;

cellulose acetate butyrate;

polyamide;

polyvinylalcohol;

polyalanide;

polyimide;

polyurethane;

polymethylmethacrylate;

polylactic acid;

polycaprolactone;

Kevlar;

Nomex;

Tedlar;

Teflon; and

Tyvek;

mixtures thereof.

128. The method of claim 119, wherein said substrate comprises credit card stock.

129. The method of claim 119 including using said metallized substrate product to prepare an article of manufacture selected from the group consisting of credit cards, bankcards, phone cards, trading cards, licenses, containers, wrapping materials, displays, and signs.

130. The method of claim 129 including using said metallized substrate product to prepare said container for use with a product selected from the group consisting of foods, cosmetics, drugs, smoking products, toys, electronics, kitchen utensils, glassware, hardware, sporting goods, wearable items, and bottled goods.