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Method of manufacturing a spectral filter for green and longer wavelengths

  • US 20050199510A1
  • Filed: 04/25/2005
  • Published: 09/15/2005
  • Est. Priority Date: 10/16/2002
  • Status: Active Grant
First Claim
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1. A method of making a spectral filter comprising:

  • providing a substrate wafer of single-crystal (100)-oriented n-doped silicon having a first surface and a second surface, providing etching starting points at a first surface of said semiconductor wafer, electrochemically etching the substrate wafer beginning at said start points to produce a structured layer having pores with controlled depths defined at least partially therethrough, said pores having coherently modulated cross-sections at least over the part of said depth, and depositing onto the pore walls at least one layer of substantially transparent material.

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