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[LASER ANNEALING APPARATUS AND LASER ANNEALING PROCESS]

  • US 20050199597A1
  • Filed: 04/08/2004
  • Published: 09/15/2005
  • Est. Priority Date: 03/11/2004
  • Status: Abandoned Application
First Claim
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1. A laser annealing apparatus, adapted to perform a laser annealing process for annealing an amorphous silicon thin film, comprising:

  • a laser-generating module, adapted to provide a laser beam to recrystallize the amorphous silicon thin film to form a polysilicon thin film;

    a resistance-measurement module, adapted to measure a sheet resistance of the polysilicon thin film for obtaining a sheet resistance value; and

    a host circuit module, electrically coupled to and between the laser-generating module and the resistance-measurement module, the host circuit module, according to the sheet resistance value, outputting a feedback signal to the laser-generating module, for optimizing an energy density of the laser beam.

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