High rate deposition of titanium dioxide
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Abstract
There is provided a structure. The structure comprises a substrate, and a titanium oxide layer disposed over the substrate. There is also provided a method of forming a titanium oxide coating on a substrate. The method includes generating a plasma; providing a first reactant, comprising titanium, and a second reactant, comprising oxygen, into the plasma stream extending to the substrate; and forming the titanium oxide coating on the substrate.
23 Citations
23 Claims
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1-22. -22. (canceled)
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23. An apparatus for forming a titanium oxide film comprising:
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a first reactant source containing TiCL4;
a second reactant source containing water vapor;
a plasma stream generator; and
a substrate holder.
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Specification