Optical interference reflective element and repairing and manufacturing methods thereof

• US 20050202649A1
• Filed: 06/21/2004
• Published: 09/15/2005
• Est. Priority Date: 03/10/2004
• Status: Active Grant

• Current Assignee: Snaptrack Incorporated (Qualcomm, Inc.)
• Original Assignee: Qualcomm MEMS Technologies Incorporated (Qualcomm, Inc.)
• Inventors: Hung, Po-Chung, Lin, Wen-Jian, Tsai, Hsiung-Kuang
• Granted Patent: US 6,980,350 B2
• Time in Patent Office: Days
• US Class Current: 438/435
• CPC Class Codes: G02B 26/001 based on interference in an adjustable optical cavity interference filters G02B5/28; devices or arrangements using multiple reflections in spectrometry or monochromators G01J3/26
• CPC Class Codes: G02F 1/21 by interference
• CPC Class Codes: G09G 2330/08 Fault-tolerant or redundant circuits, or circuits in which repair of defects is prepared
• CPC Class Codes: G09G 3/3466 based on interferometric effect

Abstract

An optical interference reflective element has a light-incident electrode and a light-reflective electrode, and each or both of the two electrodes are made of a display part and a wiring part which are electrically connected to each other with a connection part. A plurality of the interference reflective elements are connected to form an electrode line by the wiring parts, and the electrode line is used in an optical interference reflective structure formed by the optical interference reflective elements that is operated in a passive matrix mode.

Claims

1. An optical interference reflective structure, comprising:

a plurality of optical interference reflective elements, wherein each of the optical interference reflective elements comprises;

a first electrode having a first display part, a first wiring part and at least one first connection part, wherein the first display part is electrically connected to the first wiring part with the first connection part;

a second electrode; and

a support located between the first electrode and the second electrode to form a cavity;

wherein the first electrodes are electrically connected by the first wiring parts to form a plurality of first electrode lines.

2. The optical interference reflective structure of claim 1, wherein each of the second electrodes comprises a second display part, a second wiring part and at least one second connection part, the second display part is electrically connected to the second wiring part with the second connection part, and the second electrodes are electrically connected by the second wiring parts to form a plurality of second electrode lines.

3. The optical interference reflective structure of claim 1, wherein the first connection part is a bending line.

4. A method for manufacturing an optical interference reflective structure, comprising:

providing a substrate;

forming a plurality of first electrodes on the substrate, wherein the first electrodes are electrically connected to form a plurality of first electrode lines;

forming a sacrificial layer on the first electrodes;

forming a plurality of first openings in the first electrodes and the sacrificial layer;

forming a support in each of the first openings;

forming a plurality of second electrodes on the sacrificial layer and the supports, wherein each of the second electrodes comprises a first display part, a first wiring part and at least one first connection part, the first display part is electrically connected to the first wiring part with the first connection part, and the second electrodes are electrically connected by the first wiring parts to form a plurality of second electrode lines; and

removing the sacrificial layer by a release etching process.

5. The method of claim 4, wherein each of the first electrodes comprises a second display part, a second wiring part and at least one second connection part, the second display part is electrically connected to the second wiring part with the second connection part, and the first electrodes are electrically connected by the second wiring parts to form the first electrode lines.

6. The method of claim 4, wherein the first connection part is a bending line.

7. A method for manufacturing an optical interference reflective structure, comprising:

providing a substrate;

forming a plurality of first electrodes on the substrate, wherein each of the first electrodes comprises a first display part, a first wiring part and at least one first connection part, the first display part is electrically connected to the first wiring part with the first connection part, and the first electrodes are electrically connected by the first wiring parts to form a plurality of first electrode lines;

forming a sacrificial layer on the first electrodes;

forming a plurality of first openings in the first electrodes and the sacrificial layer;

forming a support in each of the first openings;

forming a plurality of second electrodes on the sacrificial layer and the supports, wherein the second electrodes are electrically connected to form a plurality of second electrode lines; and

removing the sacrificial layer by a release etching process.

8. The method of claim 7, wherein each of the second electrodes comprises a second display part, a second wiring part and at least one second connection part, the second display part is electrically connected to the second wiring part with the second connection part, and the second electrodes are electrically connected by the second wiring parts to form the second electrode lines.

9. The method of claim 7, wherein the first connection part is a bending line.

10. A method for repairing an optical interference reflective structure, the optical interference reflective structure having a plurality of optical interference reflective elements, wherein each of the optical interference reflective elements has a first electrode and a second electrode, each of the second electrodes has a display part, a wiring part and at least one connection part, the display part is electrically connected to the wiring part with the connection part, and the second electrodes are electrically connected by the wiring parts to form a plurality of electrode lines, the method comprising:

identifying a faulty optical interference reflective element from the optical interference reflective structure; and

disconnecting the connection part of the faulty optical interference reflective element.

11. The method of claim 10, wherein the method uses a laser to cut the connection part of the faulty optical interference reflective element.

12. An optical interference reflective structure, comprising:

a plurality of first wirings;

a plurality of first electrodes, wherein each of the first electrodes has a first display part and a first connection part, the first display parts are electrically connected to the corresponding first wirings by the first connection parts to form a plurality of first electrode lines;

a plurality of second electrodes, electrically connected to form a plurality of second electrode lines; and

a plurality of supports, located between the first electrodes and the second electrodes to form a plurality of optical interference reflective elements.

13. The optical interference reflective structure of claim 12, further comprising:

a plurality of second wirings, wherein each of the second electrodes has a second display part and a second connection part, the second display parts are electrically connected to the corresponding second wirings by the second connection parts to form a plurality of second electrode lines.

14. The optical interference reflective structure of claim 12, wherein the first connection part is a bending line.