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Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms

  • US 20050208217A1
  • Filed: 10/07/2004
  • Published: 09/22/2005
  • Est. Priority Date: 10/09/2003
  • Status: Active Grant
First Claim
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1. A thin-film formation apparatus comprising:

  • a reaction chamber to be evacuated;

    a placing portion for placing a substrate thereon inside said reaction chamber;

    a gas-dispersion guide disposed above said placing portion for supplying a gas onto a surface of said substrate;

    a gas-supply port for introducing a gas into said gas-dispersion guide;

    a gas-dispersion plate disposed on a substrate side of said gas-dispersion guide and having multiple gas-discharge ports;

    a first exhaust port for exhausting, downstream of said gas-dispersion plate, the gas supplied onto the substrate surface; and

    a second exhaust port for exhausting, upstream of said gas-dispersion plate, a gas inside said gas-dispersion guide through a gap between said gas-dispersion guide and said gas-dispersion plate.

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