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Method for manufacturing an electro-optical device

  • US 20050208863A1
  • Filed: 03/22/2005
  • Published: 09/22/2005
  • Est. Priority Date: 06/04/1999
  • Status: Active Grant
First Claim
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1. A method of manufacturing a light emitting device comprising:

  • forming a thin film transistor over the substrate;

    forming an interlayer insulating film over the thin film transistor;

    forming a first electrode electrically connected to the thin film transistor, over the interlayer insulating film;

    forming a bank covering an edge of the first electrode, over the interlayer insulating film;

    forming an EL layer by ink jet method;

    forming a second electrode covering the bank and the EL layer; and

    forming an insulating film covering the second electrode, wherein the EL layer is disposed adjacent to a side edge of the bank, and wherein the EL layer does not extend beyond the side edge of the bank.

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