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Modification of an image of a pattern during an imaging process

  • US 20050210438A1
  • Filed: 07/08/2004
  • Published: 09/22/2005
  • Est. Priority Date: 07/11/2003
  • Status: Abandoned Application
First Claim
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1. A method for modifying an image of a pattern during an imaging process, the pattern being arranged on a mask for imaging by a projection system on a surface, the image being an image formed from the pattern by a portion of the projection system, an imaging quality of said portion of the projection system being described by selected imaging quality parameters, and the projection system being adapted to adjust the image by image adjustment parameters, comprising:

  • (a) determining an ideal image of the pattern;

    (b) determining a simulated distorted image of the pattern based on said selected imaging quality parameters;

    (c) determining a deviation between the simulated distorted image and the ideal image; and

    (d) adapting said image adjustment parameters during said imaging process to minimize the deviation between the simulated distorted image and the ideal image on the basis of said selected imaging quality parameters.

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