Modification of an image of a pattern during an imaging process
First Claim
1. A method for modifying an image of a pattern during an imaging process, the pattern being arranged on a mask for imaging by a projection system on a surface, the image being an image formed from the pattern by a portion of the projection system, an imaging quality of said portion of the projection system being described by selected imaging quality parameters, and the projection system being adapted to adjust the image by image adjustment parameters, comprising:
- (a) determining an ideal image of the pattern;
(b) determining a simulated distorted image of the pattern based on said selected imaging quality parameters;
(c) determining a deviation between the simulated distorted image and the ideal image; and
(d) adapting said image adjustment parameters during said imaging process to minimize the deviation between the simulated distorted image and the ideal image on the basis of said selected imaging quality parameters.
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Accused Products
Abstract
A method is provided for modifying an image of a pattern during a lithographic imaging process, where the pattern is arranged on a mask for imaging by a projection system on a surface, and the image is an image formed from the pattern by the projection system. In this method the imaging quality of the projection system is described by selected imaging quality parameters, and the image is adjustable by image adjustment parameters of the projection system. The method comprises the steps of determining an ideal image of the pattern, determining a simulated distorted image of the pattern based on the selected imaging quality parameters; determining a deviation between the simulated distorted image and the ideal image, and adapting the image adjustment parameters during the imaging process to minimize the deviation between the simulated distorted image and the ideal image on the basis of the selected imaging quality parameters.
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Citations
20 Claims
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1. A method for modifying an image of a pattern during an imaging process, the pattern being arranged on a mask for imaging by a projection system on a surface, the image being an image formed from the pattern by a portion of the projection system, an imaging quality of said portion of the projection system being described by selected imaging quality parameters, and the projection system being adapted to adjust the image by image adjustment parameters, comprising:
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(a) determining an ideal image of the pattern;
(b) determining a simulated distorted image of the pattern based on said selected imaging quality parameters;
(c) determining a deviation between the simulated distorted image and the ideal image; and
(d) adapting said image adjustment parameters during said imaging process to minimize the deviation between the simulated distorted image and the ideal image on the basis of said selected imaging quality parameters. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. Apparatus for modifying an image of a pattern during an imaging process, comprising:
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an mask table constructed and arranged to support a mask;
a projection system; and
a control system adapted to control and adjust machine parameters during execution of an imaging process and comprising a processor, a memory for storing instructions and data, and input/output circuitry for handling signals transmitted to and received from actuators and sensors in said projection system, said processor being connected to said memory for processing said instructions and data and to said input/output device for controlling said signals, wherein the pattern is arranged on said mask for imaging by the projection system on a surface, the image being an image formed from the pattern by a portion of the projection system, an imaging quality of said portion of the projection system being described by selected imaging quality parameters, and said projection system being adapted to adjust the image by image adjustment parameters, and wherein the control system is further adapted to perform a method comprising;
(a) determining an ideal image of the pattern;
(b) determining a simulated distorted image of the pattern based on said selected imaging quality parameters;
(c) determining a deviation between the simulated distorted image and the ideal image; and
(d) adapting said image adjustment parameters during said imaging process to minimize the deviation between the simulated distorted image and the ideal image on the basis of said selected imaging quality parameters. - View Dependent Claims (14, 15, 16, 17, 18)
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19. A machine readable memory comprising machine executable instructions for use in an apparatus comprising a mask, a projection system, and a control system adapted to control and adjust machine parameters during execution of an imaging process and comprising a processor, a memory for storing instructions and data, and an input/output device for handling signals transmitted to and received from actuators and sensors in said projection system, said processor being connected to said memory for processing said instructions and data and to said input/output device for controlling said signals,
wherein the pattern is arranged on said mask for imaging by the projection system onto a surface, the image being an image formed from the pattern by a portion of the projection system, an imaging quality of said portion of the projection system being described by selected imaging quality parameters, and said projection system being adapted to adjust the image by image adjustment parameters, the machine executable instructions comprising instructions for performing a method comprising: -
(a) determining an ideal image of the pattern;
(b) determining a simulated distorted image of the pattern based on said selected imaging quality parameters;
(c) determining a deviation between the simulated distorted image and the ideal image; and
(d) adapting said image adjustment parameters during said imaging process to minimize the deviation between the simulated distorted image and the ideal image on the basis of said selected imaging quality parameters.
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20. Lithographic projection apparatus comprising:
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an illumination system for conditioning a beam of radiation;
a support structure for supporting a patterning device, the patterning device serving to pattern the beam according to a pattern;
a substrate table for holding a substrate; and
a projection system for projecting the patterned beam onto a target portion of the substrate, the pattern being arranged on said patterning device for imaging by a projection system on a surface, the image being an image formed from the pattern by at least a portion of the projection system, an imaging quality of said portion of the projection system being described by selected imaging quality parameters, and said projection system being adapted to adjust the image by image adjustment parameters; and
a control system adapted to perform a method comprising;
(a) determining an ideal image of the pattern;
(b) determining a simulated distorted image of the pattern based on said selected imaging quality parameters;
(c) determining a deviation between the simulated distorted image and the ideal image; and
(d) adapting said image adjustment parameters during said imaging process to minimize the deviation between the simulated distorted image and the ideal image on the basis of said selected imaging quality parameters.
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Specification