Exposure apparatus
First Claim
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1. An exposure apparatus comprising:
- a illumination optical system for illuminating a reticle with light from a light source; and
a projection optical system for projecting a pattern of the reticle onto an object, said projection optical system includes a lens closest to the object;
wherein a surface on the object side of the lens is smaller than an effective area of a surface on the reticle side of the lens, and wherein said exposure apparatus exposes the object via a liquid that is filled in a space between the lens and the object.
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Abstract
An exposure apparatus includes a illumination optical system for illuminating a reticle with light from a light source, and a projection optical system for projecting a pattern of the reticle onto an object, said projection optical system includes a lens closest to the object, wherein a surface on the object side of the lens is smaller than an effective area of a surface on the reticle side of the lens, and wherein said exposure apparatus exposes the object via a liquid that is filled in a space between the lens and the object.
356 Citations
19 Claims
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1. An exposure apparatus comprising:
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a illumination optical system for illuminating a reticle with light from a light source; and
a projection optical system for projecting a pattern of the reticle onto an object, said projection optical system includes a lens closest to the object;
wherein a surface on the object side of the lens is smaller than an effective area of a surface on the reticle side of the lens, and wherein said exposure apparatus exposes the object via a liquid that is filled in a space between the lens and the object. - View Dependent Claims (2, 3, 4, 12, 13, 14)
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5. An exposure apparatus comprising:
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a projection optical system for projecting a pattern of a reticle onto an object, said projection optical system including a lens closest to the object; and
a supply nozzle for supplying a liquid between the lens and the object;
wherein a distance between a supply port of the supply nozzle and an optical axis of the projection optical system is less than ½
of an outer diameter of a surface on the reticle side of the lens, andwherein said exposure apparatus exposes the object via the liquid. - View Dependent Claims (6, 7, 8, 9)
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10. An exposure apparatus comprising:
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a projection optical system for projecting a pattern of a reticle onto an object, said projection optical system including a lens closest to the object; and
a retaining member for retaining the lens, wherein a distance between the retaining member and an optical axis of the projection optical system is ½
or less of an effective diameter of a surface on the reticle side of the lens, andwherein said exposure apparatus exposes the object via a liquid that is filled in a space between the lens and the object. - View Dependent Claims (11)
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15. An exposure apparatus comprising:
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a illumination optical system for illuminating a reticle with light from a light source; and
a projection optical system for projecting a pattern of the reticle onto an object, said projection optical system includes a lens closest to the object, the lens includes a protective layer for preventing contact of the lens and a liquid that is filled in a space between the lens and the object, the protective layer is detachable from the lens, and a material of the protective layer does not dissolve more easily into the liquid than a material of the lens. - View Dependent Claims (16, 17)
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18. A device fabrication method comprising the steps of:
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exposing an object using an exposure apparatus; and
performing a development process for the object exposed, wherein said exposure apparatus includes, a projection optical system for projecting a pattern of a reticle onto the object, said projection optical system includes a lens closest to the object, wherein a surface on the object side of the lens is smaller than an effective area of a surface on the reticle side of the lens, and said exposure apparatus exposes the object via a liquid that is filled in a space between the lens and the object.
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19. A device fabrication method comprising the steps of:
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exposing an object using an exposure apparatus; and
performing a development process for the object exposed, wherein said exposure apparatus includes, a projection optical system for projecting a pattern of a reticle onto the object, said projection optical system includes a lens closest to the object, the lens includes a protective layer for preventing contact of the lens and a liquid that is filled in a space between the lens and the object, the protective layer is detachable from the lens, and a material of the protective layer that does not dissolve more easily into the liquid than a material of the lens.
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Specification