×

Exposure apparatus

  • US 20050213066A1
  • Filed: 03/28/2005
  • Published: 09/29/2005
  • Est. Priority Date: 03/29/2004
  • Status: Active Grant
First Claim
Patent Images

1. An exposure apparatus comprising:

  • a illumination optical system for illuminating a reticle with light from a light source; and

    a projection optical system for projecting a pattern of the reticle onto an object, said projection optical system includes a lens closest to the object;

    wherein a surface on the object side of the lens is smaller than an effective area of a surface on the reticle side of the lens, and wherein said exposure apparatus exposes the object via a liquid that is filled in a space between the lens and the object.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×