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Low zirconium hafnium halide compositions

  • US 20050214458A1
  • Filed: 02/24/2005
  • Published: 09/29/2005
  • Est. Priority Date: 03/01/2004
  • Status: Abandoned Application
First Claim
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1. A process for producing a composition comprising a hafnium-containing compound represented by the formula Hf(X)4 wherein X is the same or different and is a halide and wherein said composition has a zirconium concentration of less than about 1000 parts per million, which process comprises reacting a hafnium oxide compound, wherein said hafnium oxide compound has a zirconium concentration of less than about 1000 parts per million, with a haolgen or halogen-containing compound under reaction conditions sufficient to produce said composition.

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