Gas barrier laminate film

• US 20050214530A1
• Filed: 05/19/2005
• Published: 09/29/2005
• Est. Priority Date: 11/22/2002
• Status: Active Grant

• Current Assignee: Toppan Printing Co., Ltd. (TOPPAN Holdings, Inc.)
• Original Assignee: Toppan Printing Co., Ltd. (TOPPAN Holdings, Inc.)
• Inventors: Sasaki, Noboru, Tanaka, Tsukasa
• Granted Patent: US 7,560,168 B2
• Time in Patent Office: Days
• US Class Current: 428/347
• CPC Class Codes: B32B 2307/306 Resistant to heat
• CPC Class Codes: B32B 2307/31 Heat sealable
• CPC Class Codes: B32B 2307/581 Resistant to cut
• CPC Class Codes: B32B 2307/7242 Non-permeable
• CPC Class Codes: B32B 2439/70 Food packaging
• CPC Class Codes: B32B 27/06 as the main or only constituent of a layer, which is next to another layer of the same or of a different material next to a layer of a particular substance B32B9/045; next to a bituminous or tarry layer B32B11/046; next to a water setting substance layer B32B13/12; next to a metal layer B32B15/08; next to a glass layer B32B17/10; next to a layer formed of natural mineral fibres or particles B32B19/045; next to a wood layer B32B21/08; next to a cellulosic plastic layer B32B23/08; next to a natural or synthetic rubber layer B32B25/08
• CPC Class Codes: C08L 29/02 Homopolymers or copolymers of unsaturated alcohols C08L29/14 takes precedence
• CPC Class Codes: C08L 29/04 Polyvinyl alcohol; Partially hydrolysed homopolymers or copolymers of esters of unsaturated alcohols with saturated carboxylic acids
• CPC Class Codes: C08L 75/00 Compositions of polyureas or polyurethanes; Compositions of derivatives of such polymers
• CPC Class Codes: C09D 183/02 Polysilicates
• CPC Class Codes: Y10T 428/2817 Heat sealable
• CPC Class Codes: Y10T 428/31663 As siloxane, silicone or silane
• CPC Class Codes: Y10T 428/31855 Of addition polymer from unsaturated monomers
• CPC Class Codes: Y10T 428/31909 Next to second addition polymer from unsaturated monomers

Abstract

A gas barrier laminate film comprising a resin substrate on which a gas barrier vapor deposition layer, and a gas barrier covering layer are laminated, wherein the gas barrier covering layer is formed through the coating, and drying of a coating liquid comprising Si(OR¹)₄ or the hydrolyzates thereof, (R²Si(OR³)₃)_n or the hydrolyzates thereof (wherein R¹ and R³ are individually CH₃, C₂H₅ or C₂H₄OCH₃, and R² is an organic functional group) and a water-soluble polymer having a hydroxyl group.

Claims

1. A gas barrier laminate film comprising:

a resin substrate;

a gas barrier vapor deposition layer formed on the resin substrate and mainly containing an inorganic compound; and

a gas barrier covering layer formed on the gas barrier vapor deposition layer;

wherein the gas barrier covering layer is formed through the coating, and drying of a coating liquid which comprises;

one of materials selected from a silicon compound represented by a general formula of Si(OR¹)₄ . . . (1) and the hydrolyzates thereof;

one of materials selected from a silicon compound represented by a general formula of (R²Si(OR³)₃)_n . . . (2) and the hydrolyzates thereof (wherein R¹ and R³ are individually CH₃, C₂H₅ or C₂H₄OCH₃; and

R² is an organic functional group); and

a water-soluble polymer having hydroxyl group.

2. The gas barrier laminate film according to claim 1, wherein the inorganic compound is transparent.

3. The gas barrier laminate film according to claim 2, wherein the inorganic compound is aluminum oxide.

4. The gas barrier laminate film according to claim 3, wherein the aluminum oxide is selected from those where an abundance between aluminum and oxygen is confined within the range of:

Al;

O=1;

1.5-1;

2.0.

5. The gas barrier laminate film according to claim 1, wherein the hydrolyzable group (R¹) of the general formula Si(OR¹)₄ . . . (1) is C₂H₅.

6. The gas barrier laminate film according to claim 1, wherein the organic functional group (R²) of the general formula (R²Si(OR³)₃)_n . . . (2) is selected from the group consisting of vinyl, epoxy, methacryloxy, ureido and isocyanate.

7. The gas barrier laminate film according to claim 1, wherein when Si(OR¹)₄ is calculated as SiO₂ and when R²Si(OR³)₃ is calculated as R²Si(OH)₃, the solid matter of R²Si(OH)₃ is confined within the range of 1-50 wt % based on the total weight of solid matters.

8. The gas barrier laminate film according to claim 6, wherein the general formula (R²Si(OR³)₃)_n . . . (2) is a trimer 1,3,5-tris(3-trialkoxysilylalkyl)isocyanurate to be represented by the general formula:

(NCO—

R⁴Si(OR³)₃)₃ (wherein R⁴ is (CH₂)n, n is 1 or more).

9. The gas barrier laminate film according to claim 6, wherein the organic functional group (R²) 3-glycidoxypropyl group or 2-(3,4-epoxycyclohexyl) group.

10. The gas barrier laminate film according to claim 1, wherein when Si(OR¹)₄ is calculated as SiO₂ and R²Si(OR³)₃ is calculated as R²Si(OH)₃, the mixing ratio, based on weight, of solid matters, i.e. SiO₂/(R²Si(OH)₃/water-soluble polymer), is confined within the range of 100/100 to 100/30.

11. The gas barrier laminate film according to claim 1, wherein a primer layer comprising acrylic polyol, isocyanate and a silane coupling agent is interposed between the substrate and the inorganic vapor deposition layer.

12. The gas barrier laminate film according to claim 1, wherein a heat seal layer is further disposed on the gas barrier covering layer.