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Methods and array for creating a mathematical model of a plasma processing system

  • US 20050217797A1
  • Filed: 03/31/2004
  • Published: 10/06/2005
  • Est. Priority Date: 03/31/2004
  • Status: Active Grant
First Claim
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1. In a plasma processing system, a method of creating a simplified equivalent circuit model of a plasma processing system, including an electrical measuring device, a lower electrode, an upper electrode, and a signal generator device comprising:

  • creating a simplified equivalent circuit equation, including a set of variables, of said plasma processing system, wherein said electrical measuring device comprises a first subset of variables, said lower electrode comprises a second subset of variables, said upper electrode comprises a third subset of variables, and said signal generator device comprises a forth subset of variables;

    generating a first set of signals, each of said first set of signals being generated at a different frequency, wherein said signal generator device is coupled to said electrical measuring device, said lower electrode, and said upper electrode;

    measuring said first set of signals with said electrical measuring device, wherein at least one measured signal is generated for each of said set of variables;

    creating a simplified equivalent circuit model from said first set of signals.

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