Methods and array for creating a mathematical model of a plasma processing system
First Claim
1. In a plasma processing system, a method of creating a simplified equivalent circuit model of a plasma processing system, including an electrical measuring device, a lower electrode, an upper electrode, and a signal generator device comprising:
- creating a simplified equivalent circuit equation, including a set of variables, of said plasma processing system, wherein said electrical measuring device comprises a first subset of variables, said lower electrode comprises a second subset of variables, said upper electrode comprises a third subset of variables, and said signal generator device comprises a forth subset of variables;
generating a first set of signals, each of said first set of signals being generated at a different frequency, wherein said signal generator device is coupled to said electrical measuring device, said lower electrode, and said upper electrode;
measuring said first set of signals with said electrical measuring device, wherein at least one measured signal is generated for each of said set of variables;
creating a simplified equivalent circuit model from said first set of signals.
1 Assignment
0 Petitions
Accused Products
Abstract
A method of creating a simplified equivalent circuit model of a plasma processing system, including an electrical measuring device, a lower electrode, an upper electrode, and a signal generator device is described. The method includes creating a simplified equivalent circuit equation, including a set of variables, of the plasma processing system, wherein the electrical measuring device comprises a first subset of variables, the lower electrode comprises a second subset of variables, the upper electrode comprises a third subset of variables, and the signal generator device comprises a forth subset of variables. The method also includes generating a set of signals, each of the set of signals being generated at a different frequency, wherein the signal generator device is coupled to the electrical measuring device, the lower electrode, and the upper electrode. The method further includes measuring the set of signals with the electrical measuring device, wherein at least one measured signal is generated for each of the set of variables; and, creating a simplified equivalent circuit model from the set of signals.
-
Citations
38 Claims
-
1. In a plasma processing system, a method of creating a simplified equivalent circuit model of a plasma processing system, including an electrical measuring device, a lower electrode, an upper electrode, and a signal generator device comprising:
-
creating a simplified equivalent circuit equation, including a set of variables, of said plasma processing system, wherein said electrical measuring device comprises a first subset of variables, said lower electrode comprises a second subset of variables, said upper electrode comprises a third subset of variables, and said signal generator device comprises a forth subset of variables;
generating a first set of signals, each of said first set of signals being generated at a different frequency, wherein said signal generator device is coupled to said electrical measuring device, said lower electrode, and said upper electrode;
measuring said first set of signals with said electrical measuring device, wherein at least one measured signal is generated for each of said set of variables;
creating a simplified equivalent circuit model from said first set of signals. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
-
-
20. In a plasma processing system, an array for creating a simplified equivalent circuit model of a plasma processing system, including an electrical measuring device, a lower electrode, an upper electrode, and a signal generator device comprising:
-
a first array element for creating a simplified equivalent circuit equation, including a set of variables, of said plasma processing system, wherein said electrical measuring device comprises a first subset of variables, said lower electrode comprises a second subset of variables, said upper electrode comprises a third subset of variables, and said signal generator device comprises a forth subset of variables;
a second array element for generating a first set of signals, each of said first set of signals being generated at a different frequency, wherein said signal generator device is coupled to said electrical measuring device, said lower electrode, and said upper electrode;
a third array element for measuring said first set of signals with said electrical measuring device, wherein at least one measured signal is generated for each of said set of variables;
a forth array element for creating a simplified equivalent circuit model from said first set of signals;
a fifth array element for ascertaining from said simplified equivalent circuit model a state of a component of said plasma processing system, wherein said state is one of an acceptable state and an unacceptable state. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 36, 37, 38)
-
Specification