×

System and method for verifying and controlling the performance of a maskless lithography tool

  • US 20050219532A1
  • Filed: 03/31/2004
  • Published: 10/06/2005
  • Est. Priority Date: 03/31/2004
  • Status: Active Grant
First Claim
Patent Images

1. A maskless lithography system, comprising:

  • a spatial light modulator that includes a plurality of spatial light modulator cells;

    a reference reticle having at least one reference feature, the reference reticle located in a plane with the spatial light modulator proximate to one of the plurality of spatial light modulator cells;

    a pattern rasterizer that applies a signal to the spatial light modulator to form a die pattern that includes the at least one reference feature;

    an illumination source that emits illumination energy to illuminate the spatial light modulator and the reference reticle; and

    projection optics, having a pupil, that form a die image with illumination energy entering the pupil from the spatial light modulator and a reference image with illumination energy entering the pupil from the reference reticle.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×