ROTATION-RATE SENSOR

• US 20050223800A1
• Filed: 02/25/2003
• Published: 10/13/2005
• Est. Priority Date: 08/24/2002
• Status: Active Grant

• Current Assignee: Robert Bosch GmbH
• Original Assignee: Robert Bosch GmbH
• Inventors: Hauer, Joerg, Maurer, Dieter
• Granted Patent: US 7,260,991 B2
• Time in Patent Office: Days
• US Class Current: 73/535
• CPC Class Codes: G01C 19/5712 the devices involving a micromechanical structure

Abstract

A rotation-rate sensor includes a substrate and a centrifugal mass, in which a spiral spring device includes a bend in its anchoring region.

Claims

1-11. -11. (canceled)

12. A micromechanical rotation-rate sensor comprising:

a substrate;

an anchoring device provided on the substrate;

a spiral spring device; and

a centrifugal mass connected to the anchoring device via the spiral spring device connected to the centrifugal mass so that the centrifugal mass is elastically deflectable from its neutral position, about a rotational axis situated perpendicularly to a substrate surface and so that it is capable of rotary oscillation;

wherein the spiral spring device includes a bend at its anchoring region with the anchoring device.

13. The rotation-rate sensor of claim 12, wherein the spiral spring device is connected to the centrifugal mass to allow for radial length equalization.

14. The rotation-rate sensor of claim 12, wherein the spiral spring device includes a bent region at its connection to the centrifugal mass.

15. The rotation-rate sensor of claim 12, wherein the anchoring region of the spiral spring device is provided outside a center of the rotary oscillation.

16. The rotation-rate sensor of claim 12, further comprising:

another spiral spring device, wherein the two spiral spring devices are provided next to one another in mirror symmetry along their greatest extension, and together form one spiral spring.

17. The rotation-rate sensor of claim 12, further comprising:

another spiral spring device;

wherein the two spiral springs are positioned in a V shape such that the legs spread open in a direction of the centrifugal mass at an opening angle.

18. The rotation-rate sensor of claim 12, further comprising:

three additional spiral spring devices, wherein the four spiral springs are positioned such that they essentially form an X shape.

19. The rotation-rate sensor of claim 17, wherein the opening angle is selected such that a natural frequency is less about the axis of rotation situated perpendicularly to the substrate surface than each natural frequency about an axis of rotation situated in parallel to the substrate surface.

20. The rotation-rate sensor of claim 12, wherein the rotation-rate sensor is produced using one of a silicon surface micromechanics process and another micromechanics process.

21. The rotation-rate sensor of claim 12, wherein the anchoring device is fixedly connected to the substrate, and the anchoring device is positioned in a movable manner relative to the substrate.

22. The rotation-rate sensor of claim 18, further comprising:

at least one support spring in addition to the spiral springs forming an X shape.