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Heating jacket for plasma etching reactor, and etching method using same

  • US 20050224178A1
  • Filed: 07/10/2003
  • Published: 10/13/2005
  • Est. Priority Date: 07/11/2002
  • Status: Abandoned Application
First Claim
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1. A plasma etching reactor comprising a reaction chamber (1) surrounded by a leakproof wall (2), containing substrate support means (3), and communicating with a plasma source (4), is characterized in that it further comprises a heater liner (14) of an appropriate metal or alloy lining all or part of the leakproof wall (2) of the reaction chamber (1) in non-leakproof manner, and an intermediate thermal insulation space (15) provided between the heater liner (14) and the leakproof wall (2) of the reaction chamber (1).

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