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Lithographic apparatus and device manufacturing method

  • US 20050225734A1
  • Filed: 04/08/2004
  • Published: 10/13/2005
  • Est. Priority Date: 04/08/2004
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus comprising:

  • a radiation system for providing a projection beam of radiation;

    a support structure for supporting patterning means, the patterning means serving to pattern the projection beam according to a desired pattern;

    a substrate table for holding a substrate;

    a projection system for projecting the patterned beam onto a target portion of the substrate;

    a liquid supply system for at least partly filling a space between the final element of said projection system and said substrate with liquid, wherein said liquid supply system comprises bubble reduction means.

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