Exposure apparatus and method for producing device

• US 20050225735A1
• Filed: 06/08/2005
• Published: 10/13/2005
• Est. Priority Date: 12/10/2002
• Status: Abandoned Application

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Magome, Nobutaka, Takaiwa, Hiroaki, Arai, Dai
• Application Number:
  US11/147,356
• Publication Number:
  US 20050225735A1
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/7075 Handling workpieces outside exposure position, e.g. SMIF box
• CPC Class Codes: G03F 7/70991 Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum
• CPC Class Codes: Y10S 430/146 Laser beam

Abstract

An exposure apparatus which performs an exposure while filling a space between a projection optical system and a substrate with liquid, and in which deterioration of a device caused by adherent liquid on the substrate is suppressed is provided. A device manufacturing system (SYS) includes a main body of an exposure apparatus (EX) which fills a space between a projection optical system (PL) and a substrate (P) with a liquid (50) and projects an image of a pattern onto the substrate (P) via the projection optical system (PL) and the liquid (50); an interface section (IF) arranged between the exposure apparatus main body (EX) and a coater/developer main body (C/D) which processes the substrate (P) after exposure; and a liquid-removing unit (100) which removes the liquid (50) adhering to the substrate (P) before the exposed substrate (P) is transferred into the coater/developer main body (C/D) through the interface section (IF).

Claims

1. An exposure apparatus for transferring an image of a pattern via a liquid onto a substrate to expose the substrate therewith, the exposure apparatus comprising:

a projection optical system which projects the image of the pattern onto the substrate;

a connecting section which is connected to a processing apparatus for processing the exposed substrate; and

a liquid-removing unit which removes the liquid adhered to the substrate before the substrate is transported to the processing apparatus through the connecting section.

2. The exposure apparatus according to claim 1, wherein the liquid-removing unit includes a washing unit which washes the substrate after the exposure, and a washing liquid adhered to the substrate is removed after the substrate is washed by the washing unit.

3. The exposure apparatus according to claim 1, wherein the substrate, to which the liquid is adhered, is transported while being inclined by a predetermined angle with respect to a horizontal plane after the exposure.

4. The exposure apparatus according to claim 1, wherein the liquid-removing unit sucks the liquid on the substrate.

5. The exposure apparatus according to claim 1, wherein the liquid-removing unit dries the liquid on the substrate.

6. The exposure apparatus according to claim 1, wherein the liquid-removing unit blows off the liquid on the substrate.

7. The exposure apparatus according to claim 6, wherein the liquid-removing unit includes a rotating mechanism which rotates the substrate to which the liquid is adhered.

8. The exposure apparatus according to claim 1, wherein the liquid-removing unit inclines the substrate to which the liquid is adhered.

9. The exposure apparatus according to claim 1, wherein the liquid-removing unit removes the liquid adhered to both surfaces of the substrate.

10. The exposure apparatus according to claim 1, wherein the liquid-removing unit removes the liquid adhered to a back surface of the substrate.

11. The exposure apparatus according to claim 1, further comprising a liquid supply unit which supplies the liquid, and a liquid recovery unit which recovers the liquid supplied by the liquid supply unit, wherein the liquid-removing unit removes the liquid which is not recovered by the liquid recovery unit and which remains on a substrate surface after completion of the exposure for the substrate.

12. The exposure apparatus according to claim 11, further comprising a first holding member which holds the substrate, and a second holding member which holds another substrate, wherein the liquid-removing unit removes the liquid adhered to the substrate held by one of the holding members during the exposure for the substrate held by the other holding member.

13. The exposure apparatus according to claim 1, further comprising a first holding member which holds the substrate, and a second holding member which holds another substrate, wherein the liquid-removing unit removes the liquid adhered to the substrate held by one of the holding members during the exposure for the substrate held by the other holding member.

14. The exposure apparatus according to claim 1, further comprising a substrate stage, wherein the liquid-removing unit is provided in the substrate stage.

15. A method for producing a device, comprising using the exposure apparatus as defined in claim 1.

16. An exposure system comprising:

the exposure apparatus as defined in claim 1;

and

a processing apparatus which processes an exposed substrate.

17. The exposure system according to claim 16, wherein the processing apparatus includes at least one of a coating unit which coats a base member of the substrate with photosensitive material, and a developing unit which develops the exposed substrate.

18. An exposure apparatus for transferring an image of a pattern via a liquid onto a substrate to expose the substrate therewith, the exposure apparatus comprising:

a projection optical system which projects the image of the pattern onto the substrate;

a liquid-removing unit which removes the liquid adhered to the substrate;

a first transport member which transports the exposed substrate to the liquid-removing unit; and

a second transport member which transports, from the liquid-removing unit, the substrate from which the liquid has been removed by the liquid-removing unit.

19. The exposure apparatus according to claim 18, wherein at least a part of a surface of the first transport member is liquid-repellent.

20. The exposure apparatus according to claim 18, wherein the liquid-removing unit includes a washing unit which washes the substrate after the exposure, and a washing liquid adhered to the substrate is removed after the substrate is washed by the washing unit.

21. The exposure apparatus according to claim 18, wherein the substrate, to which the liquid is adhered, is transported while being inclined by a predetermined angle with respect to a horizontal plane after the exposure.

22. The exposure apparatus according to claim 18, wherein the liquid-removing unit sucks the liquid on the substrate.

23. The exposure apparatus according to claim 18, wherein the liquid-removing unit dries the liquid on the substrate.

24. The exposure apparatus according to claim 18, wherein the liquid-removing unit blows off the liquid on the substrate.

25. The exposure apparatus according to claim 24, wherein the liquid-removing unit includes a rotating mechanism which rotates the substrate to which the liquid is adhered.

26. The exposure apparatus according to claim 18, wherein the liquid-removing unit inclines the substrate to which the liquid is adhered.

27. The exposure apparatus according to claim 18, wherein the liquid-removing unit removes the liquid adhered to both surfaces of the substrate.

28. The exposure apparatus according to claim 18, wherein the liquid-removing unit removes the liquid adhered to a back surface of the substrate.

29. The exposure apparatus according to claim 18, further comprising a liquid supply unit which supplies the liquid, and a liquid recovery unit which recovers the liquid supplied by the liquid supply unit, wherein the liquid-removing unit removes the liquid which is not recovered by the liquid recovery unit and which remains on a substrate surface after completion of the exposure for the substrate.

30. The exposure apparatus according to claim 29, further comprising a first holding member which holds the substrate, and a second holding member which holds another substrate, wherein the liquid-removing unit removes the liquid adhered to the substrate held by one of the holding members during the exposure for the substrate held by the other holding member.

31. The exposure apparatus according to claim 18, further comprising a first holding member which holds the substrate, and a second holding member which holds another substrate, wherein the liquid-removing unit removes the liquid adhered to the substrate held by one of the holding members during the exposure for the substrate held by the other holding member.

32. A method for producing a device, comprising using the exposure apparatus as defined in claim 18.

33. An exposure system comprising:

the exposure apparatus as defined in claim 18;

and

a processing apparatus which processes an exposed substrate.

34. The exposure system according to claim 33, wherein the processing apparatus includes at least one of a coating unit which coats a base member of the substrate with photosensitive material, and a developing unit which develops the exposed substrate.

35. An exposure apparatus for transferring an image of a pattern via a liquid onto a substrate to expose the substrate therewith, the exposure apparatus comprising:

a projection optical system which projects the image of the pattern onto the substrate;

a transport system which transports the exposed substrate; and

a liquid-removing unit which is provided on a transport passage for the substrate and which removes the liquid adhered to the substrate, wherein;

the liquid-removing unit has a cover which covers at least a part of surroundings of the substrate so that the liquid is prevented from being scattered when the liquid is removed.

36. The exposure apparatus according to claim 35, wherein the cover includes a chamber.

37. The exposure apparatus according to claim 35, wherein the liquid-removing unit includes a washing unit which washes the substrate after the exposure, and a washing liquid adhered to the substrate is removed after the substrate is washed by the washing unit.

38. The exposure apparatus according to claim 35, wherein the substrate, to which the liquid is adhered, is transported while being inclined by a predetermined angle with respect to a horizontal plane after the exposure.

39. The exposure apparatus according to claim 35, wherein the liquid-removing unit sucks the liquid on the substrate.

40. The exposure apparatus according to claim 35, wherein the liquid-removing unit dries the liquid on the substrate.

41. The exposure apparatus according to claim 35, wherein the liquid-removing unit blows off the liquid on the substrate.

42. The exposure apparatus according to claim 41, wherein the liquid-removing unit includes a rotating mechanism which rotates the substrate to which the liquid is adhered.

43. The exposure apparatus according to claim 35, wherein the liquid-removing unit inclines the substrate to which the liquid is adhered.

44. The exposure apparatus according to claim 35, wherein the liquid-removing unit removes the liquid adhered to both surfaces of the substrate.

45. The exposure apparatus according to claim 35, wherein the liquid-removing unit removes the liquid adhered to a back surface of the substrate.

46. The exposure apparatus according to claim 35, further comprising a liquid supply unit which supplies the liquid, and a liquid recovery unit which recovers the liquid supplied by the liquid supply unit, wherein the liquid-removing unit removes the liquid which is not recovered by the liquid recovery unit and which remains on a substrate surface after completion of the exposure for the substrate.

47. The exposure apparatus according to claim 46, further comprising a first holding member which holds the substrate, and a second holding member which holds another substrate, wherein the liquid-removing unit removes the liquid adhered to the substrate held by one of the holding members during the exposure for the substrate held by the other holding member.

48. The exposure apparatus according to claim 35, further comprising a first holding member which holds the substrate, and a second holding member which holds another substrate, wherein the liquid-removing unit removes the liquid adhered to the substrate held by one of the holding members during the exposure for the substrate held by the other holding member.

49. A method for producing a device, comprising using the exposure apparatus as defined in claim 35.

50. An exposure system comprising:

the exposure apparatus as defined in claim 35;

and

a processing apparatus which processes an exposed substrate.

51. The exposure system according to claim 50, wherein the processing apparatus includes at least one of a coating unit which coats a base member of the substrate with photosensitive material, and a developing unit which develops the exposed substrate.

52. An exposure apparatus for transferring an image of a pattern via a liquid onto a substrate to expose the substrate therewith, the exposure apparatus comprising:

a projection optical system which projects the image of the pattern onto the substrate;

a substrate stage which holds the substrate; and

a liquid-removing unit which removes the liquid adhered to the substrate before the exposed substrate is exported from the substrate stage.

53. The exposure apparatus according to claim 52, wherein the substrate, to which the liquid is adhered, is transported while being inclined by a predetermined angle with respect to a horizontal plane after the exposure.

54. The exposure apparatus according to claim 52, wherein the liquid-removing unit sucks the liquid on the substrate.

55. The exposure apparatus according to claim 52, wherein the liquid-removing unit dries the liquid on the substrate.

56. The exposure apparatus according to claim 52, wherein the liquid-removing unit blows off the liquid on the substrate.

57. The exposure apparatus according to claim 56, wherein the liquid-removing unit includes a rotating mechanism which rotates the substrate to which the liquid is adhered.

58. The exposure apparatus according to claim 52, wherein the liquid-removing unit inclines the substrate to which the liquid is adhered.

59. The exposure apparatus according to claim 52, wherein the liquid-removing unit removes the liquid adhered to both surfaces of the substrate.

60. The exposure apparatus according to claim 52, wherein the liquid-removing unit removes the liquid adhered to a back surface of the substrate.

61. The exposure apparatus according to claim 52, further comprising a liquid supply unit which supplies the liquid, and a liquid recovery unit which recovers the liquid supplied by the liquid supply unit, wherein the liquid-removing unit removes the liquid which is not recovered by the liquid recovery unit and which remains on a substrate surface after completion of the exposure for the substrate.

62. The exposure apparatus according to claim 61, further comprising a first holding member which holds the substrate, and a second holding member which holds another substrate, wherein the liquid-removing unit removes the liquid adhered to the substrate held by one of the holding members during the exposure for the substrate held by the other holding member.

63. The exposure apparatus according to claim 52, further comprising a first holding member which holds the substrate, and a second holding member which holds another substrate, wherein the liquid-removing unit removes the liquid adhered to the substrate held by one of the holding members during the exposure for the substrate held by the other holding member.

64. The exposure apparatus according to claim 52, wherein the liquid-removing unit is provided in the substrate stage.

65. A method for producing a device, comprising using the exposure apparatus as defined in claim 52.

66. An exposure system comprising:

the exposure apparatus as defined in claim 52;

and

a processing apparatus which processes an exposed substrate.

67. The exposure system according to claim 66, wherein the processing apparatus includes at least one of a coating unit which coats a base member of the substrate with photosensitive material, and a developing unit which develops the exposed substrate.

68. An exposure apparatus for transferring an image of a pattern via a liquid onto a substrate to expose the substrate therewith, the exposure apparatus comprising:

a projection optical system which projects the image of the pattern onto the substrate;

a transport system which transports the exposed substrate; and

a liquid-processing mechanism which processes the liquid fallen from the substrate after the exposure and which is arranged under at least a part of a transport passage for the substrate.

69. The exposure apparatus according to claim 68, wherein the liquid-processing mechanism includes a gutter member which is arranged under at least a part of the transport passage, and a discharge mechanism which discharges the liquid recovered by the gutter member.

70. A method for producing a device, comprising using the exposure apparatus as defined in claim 68.

71. An exposure system comprising:

the exposure apparatus as defined in claim 68;

and

a processing apparatus which processes an exposed substrate.

72. The exposure system according to claim 71, wherein the processing apparatus includes at least one of a coating unit which coats a base member of the substrate with photosensitive material, and a developing unit which develops the exposed substrate.

73. An exposure apparatus for transferring an image of a pattern via a liquid onto a substrate to expose the substrate therewith, the exposure apparatus comprising:

a projection optical system which projects the image of the pattern onto the substrate; and

a washing unit which washes the exposed substrate before the substrate is exported to a processing apparatus which processes the exposed substrate.

74. The exposure apparatus according to claim 73, wherein the washing unit washes the substrate by using a washing liquid.

75. The exposure apparatus according to claim 73, wherein the washing unit is provided in a transport passage for the substrate to be transported after the exposure.

76. The exposure apparatus according to claim 73, wherein the liquid is different from water.

77. A method for producing a device, comprising using the exposure apparatus as defined in claim 73.

78. An exposure system comprising:

the exposure apparatus as defined in claim 73;

and

a processing apparatus which processes an exposed substrate.

79. The exposure system according to claim 78, wherein the processing apparatus includes at least one of a coating unit which coats a base member of the substrate with photosensitive material, and a developing unit which develops the exposed substrate.

80. An exposure apparatus for transferring an image of a pattern via a liquid onto a substrate to expose the substrate therewith, the exposure apparatus comprising:

a projection optical system which projects the image of the pattern onto the substrate;

a first transport member which transports the substrate to which the liquid is adhered; and

a second transport member which transports the substrate to which the liquid is not adhered.

81. The exposure apparatus according to claim 80, further comprising a liquid-removing unit which removes the liquid for the exposure existing on the substrate, wherein the first transport member transports, to the liquid-removing unit, the substrate to which the liquid is adhered.

82. The exposure apparatus according to claim 80, wherein a surface of at least a part of the first transport member is liquid-repellent.

83. The exposure apparatus according to claim 80, further comprising a liquid-processing mechanism which processes the liquid fallen from the substrate and which is arranged under at least a part of a transport passage for the substrate to be transported by the first transport member.

84. A method for producing a device, comprising using the exposure apparatus as defined in claim 80.

85. An exposure system comprising:

the exposure apparatus as defined in claim 80;

and

a processing apparatus which processes an exposed substrate.

86. The exposure system according to claim 85, wherein the processing apparatus includes at least one of a coating unit which coats a base member of the substrate with photosensitive material, and a developing unit which develops the exposed substrate.

87. An exposure apparatus for exposing a substrate by radiating an exposure light beam onto the substrate via a liquid, the exposure apparatus comprising:

a first holding member which is movable while holding the substrate;

a second holding member which is movable while holding another substrate; and

a liquid-removing unit which removes the liquid adhered to the substrate for which the exposure is completed and which is held by the second holding member when the substrate, which is held by the first holding member, is subjected to the exposure.

88. A method for producing a device, comprising using the exposure apparatus as defined in claim 87.

89. An exposure system comprising:

the exposure apparatus as defined in claim 87;

and

a processing apparatus which processes an exposed substrate.

90. The exposure system according to claim 89, wherein the processing apparatus includes at least one of a coating unit which coats a base member of the substrate with photosensitive material, and a developing unit which develops the exposed substrate.

91. A liquid-removing apparatus to be used together with an exposure apparatus for transferring an image of a pattern via a liquid onto a substrate to expose the substrate therewith, the liquid-removing apparatus comprising:

a holding section which holds the exposed substrate; and

a liquid-removing mechanism which removes the liquid for the exposure existing on the substrate.

92. The liquid-removing apparatus according to claim 91, further comprising a cover which surrounds the liquid-removing mechanism.

93. The liquid-removing apparatus according to claim 91, further comprising a transport unit which transports the substrate to the holding section.