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Exposure apparatus and method for producing device

  • US 20050225735A1
  • Filed: 06/08/2005
  • Published: 10/13/2005
  • Est. Priority Date: 12/10/2002
  • Status: Abandoned Application
First Claim
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1. An exposure apparatus for transferring an image of a pattern via a liquid onto a substrate to expose the substrate therewith, the exposure apparatus comprising:

  • a projection optical system which projects the image of the pattern onto the substrate;

    a connecting section which is connected to a processing apparatus for processing the exposed substrate; and

    a liquid-removing unit which removes the liquid adhered to the substrate before the substrate is transported to the processing apparatus through the connecting section.

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