Projection objective for immersion lithography
First Claim
1. A projection objective for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between an optical element of the projection objective and the image plane, the optical element having a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the optical element to degradation caused by the immersion medium.
2 Assignments
0 Petitions
Accused Products
Abstract
In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.
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Citations
69 Claims
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1. A projection objective for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between an optical element of the projection objective and the image plane,
the optical element having a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the optical element to degradation caused by the immersion medium.
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52. A method for protecting a projection objective, which is designed for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between an optical element of the projection objective and the image plane, against degradation of optical properties caused by the immersion medium, comprising:
fitting of a protective layer system provided for contact with the immersion medium at least to an exit side of the substrate. - View Dependent Claims (53, 55, 56, 57)
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58. An optical element having:
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a transparent substrate; and
at least one protective layer system that is fitted to the substrate, is provided for contact with an immersion medium and serves for increasing the resistance of the optical element to degradation caused by the immersion medium. - View Dependent Claims (59, 60, 61, 62, 66)
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64. An optical system having:
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at least one optical element provided for contact with an immersion medium;
the optical element having a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the optical element to degradation caused by the immersion medium. - View Dependent Claims (65)
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67. A method for protecting a projection objective, which is designed for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between an optical element of the projection objective and the image plane, against degradation of optical properties caused by the immersion medium, comprising:
use of a cooled immersion medium with a media temperature lying below an ambient temperature of the projection objective. - View Dependent Claims (68, 69)
Specification