×

Projection objective for immersion lithography

  • US 20050225737A1
  • Filed: 12/20/2004
  • Published: 10/13/2005
  • Est. Priority Date: 12/19/2003
  • Status: Active Grant
First Claim
Patent Images

1. A projection objective for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between an optical element of the projection objective and the image plane, the optical element having a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the optical element to degradation caused by the immersion medium.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×