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Thin-film deposition apparatus

  • US 20050229848A1
  • Filed: 04/15/2004
  • Published: 10/20/2005
  • Est. Priority Date: 04/15/2004
  • Status: Active Grant
First Claim
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1. A gas-feeding apparatus configured to be connected to an evacuatable reaction chamber provided with a support for placing a substrate thereon, comprising:

  • a gas-distribution head for introducing gases into the chamber through a head surface, comprising a first section for discharging a gas through the head surface toward the support and a second section for discharging a gas through the head surface toward the support, said first and said second sections being isolated from each other in the gas-distribution head, at least one of which section is coupled to an exhaust system for purging therefrom a gas present in the corresponding section without passing through the head surface.

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