Liquid immersion type exposure apparatus

• US 20050233081A1
• Filed: 09/01/2004
• Published: 10/20/2005
• Est. Priority Date: 09/04/2003
• Status: Active Grant

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Inventors: Tokita, Toshinobu
• Granted Patent: US 7,053,983 B2
• Time in Patent Office: Days
• US Class Current: 427/256
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041

Abstract

Disclosed is an exposure apparatus which includes a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of the projection optical system which optical element is nearest to the substrate, a supplying system for supplying a liquid medium, a collecting system for collecting a liquid medium, and an exhausting system for removing a bubble in the liquid medium through a bubble removing material having such property that it passes a gas but it does not pass a liquid.

Claims

1. An exposure apparatus, comprising:

a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of said projection optical system which optical element is nearest to the substrate;

a supplying system for supplying a liquid medium;

a collecting system for collecting a liquid medium; and

an exhausting system for removing a bubble in the liquid medium through a bubble removing material having such property that it passes a gas but it does not pass a liquid.

2. An apparatus according to claim 1, wherein a clearance is defined between said bubble removing material and said exhausting system.

3. An apparatus according to claim 1, wherein said supplying system supplies the liquid medium through a liquid supplying material having a liquid absorbing property.

4. An apparatus according to claim 1, wherein said collecting system collects the liquid medium through a liquid collecting material having a liquid absorbing property.

5. An apparatus according to claim 4, wherein said collecting system includes a replacing mechanism for replacing the liquid collecting material.

6. An apparatus according to claim 1, wherein said bubble removing material is disposed at least in a portion of an outer periphery of the optical element.

7. An apparatus according to claim 3, wherein said bubble removing material is disposed at least in a portion of an outer periphery of the optical element, and wherein said liquid supplying material is disposed at least in a portion of an outer periphery of said bubble removing material.

8. An apparatus according to claim 3, wherein said liquid supplying material is disposed at least in a portion of an outer periphery of the optical element, and wherein said bubble removing material is disposed at least in a portion at a side of the substrate which side is remote from the liquid supplying material.

9. An apparatus according to claim 4, wherein said bubble removing material is disposed at least in a portion of an outer periphery of the optical element, and wherein said liquid collecting material is disposed at least in a portion of an outer periphery of said bubble removing material.

10. An apparatus according to claim 1, wherein said collecting system collects the liquid medium through a liquid collecting material having a liquid absorbing property, and wherein said liquid supplying material is disposed at least in a portion of an outer periphery of the optical element while said liquid collecting material is disposed at least in a portion of an outer periphery of said liquid supplying material.

11. An apparatus according to claim 8, wherein said collecting system collects the liquid medium through a liquid collecting material having a liquid absorbing property, and wherein said liquid supplying material is disposed at least in a portion of an outer periphery of the optical element while said liquid collecting material is disposed at least in a portion of an outer periphery of said liquid supplying material.

12. An apparatus according to claim 3, further comprising a first controller for controlling the liquid medium supplying rate of said supplying system so as to maintain a state that the amount of liquid absorption of the liquid supplying material is substantially saturated.

13. An apparatus according to claim 12, further comprising a second controller for controlling the liquid medium supplying rate of said supplying system substantially at the same level as the liquid medium supplying rate as controlled by said first controller.

14. An apparatus according to claim 4, further comprising a controller for controlling the liquid medium collecting rate of said collecting system so as to maintain a state that the amount of liquid absorption of said liquid collecting material is not saturated.

17. A device manufacturing method, comprising the steps of:

exposing a substrate by use of an exposure apparatus as recited in claim 1;

and

developing the exposed substrate.

15. An exposure apparatus, comprising:

a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of said projection optical system which optical element is nearest to the substrate;

a supplying system for supplying a liquid medium;

a collecting system for collecting a liquid medium; and

an exhausting system for removing a bubble in the liquid medium through a porous material.

18. A device manufacturing method, comprising the steps of:

exposing a substrate by use of an exposure apparatus as recited in claim 15;

and

developing the exposed substrate.

16. An exposure apparatus, comprising:

a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of said projection optical system which optical element is nearest to the substrate;

a supplying system for supplying a liquid medium through a porous material; and

a collecting system for collecting a liquid medium.

19. A device manufacturing method, comprising the steps of:

exposing a substrate by use of an exposure apparatus as recited in claim 16;

and

developing the exposed substrate.