Stage positioning unit for photo lithography tool and for the like

• US 20050236908A1
• Filed: 03/03/2003
• Published: 10/27/2005
• Est. Priority Date: 03/08/2002
• Status: Active Grant

• Current Assignee: Eugeny I. Rivin
• Original Assignee: Eugeny I. Rivin
• Inventors: Rivin, Eugeny I.
• Granted Patent: US 7,002,668 B2
• Time in Patent Office: Days
• US Class Current: 310/10
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
• CPC Class Codes: G03F 7/70725 control
• CPC Class Codes: G03F 7/70766 Reaction force control means, e.g. countermass
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A photolithography tool, e.g. for microelectronics production, having the stage units (both mask and substrate stage units) composed of two identical stage assemblies which are simultaneously driven with the programmed production motions. The acceleration time histories of the stage assemblies within the unit are identical but opposite in direction. Thus, the photolithography tool processes two substrates simultaneously while being free from objectionable dynamic loads and from shifts of its center of mass.

Claims

1. A stage unit comprising:

two identical movable stage assemblies with the stage in each stage assembly performing a combination of pre-programmed and corrective motions, with said corrective motions being determined by deviations of the stages from the precise positions as detected by the sensing and measuring devices,

wherein accelerations of the pre-programmed motions of the two stage assemblies in at least one coordinate direction have the same time histories but opposite directions.

2. A stage unit from claim 1, wherein each stage assembly is driven by identical actuators each having the first and the second parts, with said first parts of each actuator attached to and imparting motion onto the stage assembly.

4. A photolithography tool of claim 2, wherein said two radiation sources are integrated into a single radiation source whose radiation is split into two identical beams radiating through said optical means for irradiating said masks.

3. A photolithography tool comprising:

two radiation sources for generating radiation for exposure of two substrates;

two optical means for irradiating two masks with radiation emitted from said radiation source to transfer mask patterns onto substrates to be exposed;

a mask stage unit comprising two movable mask stage assemblies for adjusting relative positional relationships between said masks and the respective substrates to be exposed;

two focusing units disposed between said masks and said respective substrates to be exposed;

a substrate stage unit comprising two movable stage assemblies, with each substrate stage assembly carrying a substrate exposed by light passing from the respective illumination source, through the respective optical means, through the respective mask, and through the respective focusing unit,

said movable mask stage assemblies and said movable substrate stage assemblies performing a combination of pre-programmed and corrective motions, with said corrective motions being determined by deviations of the stages from the pre-programmed precise positions as detected by the sensing and measuring devices,

wherein the pre-programmed motions of the two mask stage assemblies have the same time histories but opposite directions, and

the preprogrammed motions of the two substrate stage assemblies have the same time histories but opposite directions.