Methods for producing ruthenium film and ruthenium oxide film
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Abstract
To provide a method that can relatively rapidly deposit a ruthenium film that adheres well to substrate and that also does not incorporate impurities.
Method for producing ruthenium film, characterized by reacting a gaseous volatile inorganic ruthenium compound with a gaseous reducing agent by introducing the gaseous volatile inorganic ruthenium compound and gaseous reducing agent into a reaction chamber (11) that holds at least one substrate and thereby depositing ruthenium on the at least one substrate.
81 Citations
24 Claims
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1-12. -12. (canceled)
- 13. A method for producing ruthenium film, characterized by reacting a gaseous volatile inorganic ruthenium compound with a gaseous reducing agent by introducing the gaseous volatile inorganic ruthenium compound and gaseous reducing agent into a reaction chamber that holds at least one substrate and thereby depositing ruthenium on the at least one substrate.
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22. A method for the production of ruthenium oxide film, characterized by:
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a) introducing gaseous volatile ruthenium oxide into a reaction chamber that holds at least one substrate; and
b) decomposing the volatile ruthenium oxide under the application of heat and depositing a ruthenium oxide film on the at least one substrate. - View Dependent Claims (23, 24)
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Specification