Gas barrier laminate film, method for producing the same and image display device utilizing the film

• US 20050238846A1
• Filed: 03/10/2005
• Published: 10/27/2005
• Est. Priority Date: 03/10/2004
• Status: Abandoned Application

• Current Assignee: Fujifilm Corporation (Fujifilm Holdings Corporation)
• Original Assignee: Fuji Photo Film Co Limited (Fujifilm Holdings Corporation)
• Inventors: Arakatsu, Hiroshi, Sakurai, Seiya
• Application Number:
  US11/076,228
• Publication Number:
  US 20050238846A1
• Time in Patent Office: Days
• US Class Current: 428/141
• CPC Class Codes: B32B 27/08 of synthetic resin
• CPC Class Codes: G02F 1/133345 Insulating layers G02F1/1335, G02F1/1337, G02F1/135, G02F1/136 take precedence
• CPC Class Codes: Y10T 428/24355 Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
• CPC Class Codes: Y10T 428/25 Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles

Abstract

In a gas barrier laminate film comprising a gas barrier layer laminated on at least one surface of a support, the surface of the support on the side opposite to the surface laminated with the gas barrier layer is made to have an Ra value of 1 to 20 nm. A gas barrier laminate film that can prevent cracks generated by displacement of rolled film, slacks and wrinkles during rolling up and transportation in the production process of the film and thus can be produced with a high yield, a method for producing the same and an image display device utilizing the film are provided.

Claims

1. A gas barrier laminate film comprising a gas barrier layer laminated on at least one surface of a support, wherein a surface of the support on the side opposite to the surface laminated with the gas barrier layer has unevenness represented by an Ra value of 1 to 20 nm.

2. The gas barrier laminate film according to claim 1, wherein the Ra value is within the range of 2 to 8 nm.

3. The gas barrier laminate film according to claim 1, wherein the gas barrier layer consists of at least three layers of alternately laminated organic layer and inorganic layer.

4. The gas barrier laminate film according to claim 1, which has 50 to 150 mg/m² of a matting agent having an average particle size less than 1 μ

m as an equivalent spherical diameter on the surface of the support on the side opposite to the surface laminated with the gas barrier layer.

5. The gas barrier laminate film according to claim 4, wherein the matting agents have a microhardness of 100 to 250 N/mm².

6. The gas barrier laminate film according to claim 1, which has 10 to 25 mg/m² of a matting agent having an average particle size of 1 to 3 μ

m as an equivalent spherical diameter on the surface of the support on the side opposite to the surface laminated with the gas barrier layer.

7. The gas barrier laminate film according to claim 6, wherein the matting agents have a microhardness of 100 to 250 N/mm².

8. The gas barrier laminate film according to claim 1, wherein the surface of the support on the side opposite to the surface laminated with the gas barrier layer is a surface having unevenness formed by at least one kind of treatment selected from the group consisting of corona discharge treatment, electron beam irradiation and flame treatment.

9. The gas barrier laminate film according to claim 1, wherein the surface of the support on the side opposite to the surface laminated with the gas barrier layer is a surface having unevenness formed by pressing an embossing roller having an Ra value of 10 nm to 1 μ

m and an RSm value of 20 μ

m or less.

10. The gas barrier laminate film according to claim 1, wherein the surface of the support on the side opposite to the surface laminated with the gas barrier layer has a surface resistance of 1 to 1×

10¹⁰ Ω

/□

in an environment of 25°

C. and 50% RH.

11. The gas barrier laminate film according to claim 1, wherein the support is a heat resistant support comprising a polymer having a glass transition temperature of 200°

C. or higher.

12. The gas barrier laminate film according to claim 1, wherein the support is a film comprising a polymer having a spiro structure represented by the following formula (1):

13. The gas barrier laminate film according to claim 1, wherein the support is a film comprising a polymer having a cardo structure represented by the following formula (2):

14. An image display device utilizing the gas barrier laminate film according to claim 1.

15. The image display device according to claim 14, wherein the image display device is an organic EL device.

16. A method for producing a gas barrier laminate film comprising a gas barrier layer laminated on at least one surface of a heat resistant support, wherein before, during or after lamination of the gas barrier layer on the support, the surface of the support on the side opposite to the surface laminated with the gas barrier layer is subjected to at least one kind of treatment selected from the group consisting of chemical etching, physical etching, embossing and coating of matting agents to form unevenness represented by an Ra value of 1 to 20 nm on the treated surface.

17. The method for producing a gas barrier laminate film according to claim 16, wherein the treatment is conducted before the lamination of the gas barrier layer on the support.

18. The method for producing a gas barrier laminate film according to claim 16, wherein the treatment is at least one kind selected from the group consisting of corona discharge treatment, electron beam irradiation and flame treatment.

19. The method for producing a gas barrier laminate film according to claim 16, wherein the treatment is corona discharge treatment.

20. The method for producing a gas barrier laminate film according to claim 16, wherein the treatment is pressing with an embossing roller having an Ra value of 10 nm to 1 μ

m and an RSm value of 20 μ

m or less.