Methods of making magnetic write heads using electron beam lithography
First Claim
1. A method of making a magnetic head, comprising the acts of:
- forming a pedestal over a first pole piece layer;
forming insulator materials to surround the pedestal;
depositing a gap layer over the pedestal and the insulator materials;
forming a second pole piece over the gap layer by;
forming a patterned resist for the second pole piece by exposing a portion of a resist to an electron beam and etching to remove the exposed portion;
electroplating second pole piece materials within the patterned resist;
etching the gap layer such that side portions of the gap layer are removed and a central portion remains between the second pole piece and the pedestal;
etching to remove at least top portions of the insulator materials which surround the pedestal; and
milling the pedestal, using the second pole piece as a mask, to form a central notched structure having side walls with angled slopes.
1 Assignment
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Accused Products
Abstract
A pedestal is formed over a first pole piece layer and insulator materials are formed to surround it. A gap layer made of a non-magnetic insulator or metal is then formed over the pedestal and the insulator, followed by the optional formation of a seed layer. A second pole piece is formed over the gap layer with or without the seed layer by forming a patterned resist using E-beam lithography and electroplating second pole piece materials within the patterned resist. After milling to remove side portions of the gap layer and the optional seed layer, a chemical etch is performed to remove a top portion of the insulator materials. The pedestal is then notched and trimmed by ion milling using the second pole piece as a mask to form a central notched structure. Since the second pole piece is precisely centered over the pedestal prior to notching, the pedestal is notched symmetrically to form a notched structure having side walls with angled slopes.
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Citations
30 Claims
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1. A method of making a magnetic head, comprising the acts of:
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forming a pedestal over a first pole piece layer;
forming insulator materials to surround the pedestal;
depositing a gap layer over the pedestal and the insulator materials;
forming a second pole piece over the gap layer by;
forming a patterned resist for the second pole piece by exposing a portion of a resist to an electron beam and etching to remove the exposed portion;
electroplating second pole piece materials within the patterned resist;
etching the gap layer such that side portions of the gap layer are removed and a central portion remains between the second pole piece and the pedestal;
etching to remove at least top portions of the insulator materials which surround the pedestal; and
milling the pedestal, using the second pole piece as a mask, to form a central notched structure having side walls with angled slopes. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A method of making a magnetic head, comprising:
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electroplating a pedestal over a first pole piece layer;
forming insulator materials to surround the electroplated pedestal;
depositing a gap layer over the electroplated pedestal and the insulator materials, the gap layer comprising a non-magnetic metal;
forming a second pole piece over the gap layer by;
forming a patterned resist for the second pole piece by exposing a portion of a resist to an electron beam and etching to remove the exposed portion;
electroplating second pole piece materials within the patterned resist;
etching the gap layer such that side portions of the gap layer are removed and a central portion remains between the second pole piece and the electroplated pedestal;
performing a chemical-etch to remove at least top portions of the insulator; and
milling the electroplated pedestal, using the second pole piece as a mask, to form a central notched structure having side walls with angled slopes. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21)
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22. A method of making a magnetic head comprising the acts of:
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forming a pedestal over a first pole piece layer;
forming insulator materials to surround the pedestal;
forming a gap layer over the pedestal and the insulator materials;
depositing a seed layer over the gap layer;
forming a second pole piece over the seed layer by;
forming a patterned resist for the second pole piece by exposing a portion of a resist to an electron beam and etching to remove the exposed portion;
electroplating second pole piece materials within the patterned resist;
etching the seed layer such that side portions of the seed layer are removed and a central portion remains between the gap layer and the second pole piece;
etching the gap layer such that side portions of the gap layer are removed and a central portion remains between the seed layer and the pedestal;
performing a chemical etch to remove at least top portions of the insulator; and
ion milling the pedestal, using the second pole piece as a mask, to form a central notched structure having side walls with angled slopes. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30)
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Specification