Methods of making magnetic write heads using electron beam lithography

• US 20050241139A1
• Filed: 04/30/2004
• Published: 11/03/2005
• Est. Priority Date: 04/30/2004
• Status: Active Grant

• Current Assignee: Hitachi Global Storage Technologies Netherlands BV (Western Digital Corporation)
• Original Assignee: Hitachi Global Storage Technologies Netherlands BV (Western Digital Corporation)
• Inventors: Lee, Kim Y., Lo, Jyh-Shuey Jerry
• Granted Patent: US 7,086,139 B2
• Time in Patent Office: Days
• US Class Current: 29/603.10
• CPC Class Codes: G11B 5/1878 disposed immediately adjacent to the transducing gap, e.g. "Metal-In-Gap" structure
• CPC Class Codes: Y10T 29/49021 Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
• CPC Class Codes: Y10T 29/49032 Fabricating head structure or component thereof
• CPC Class Codes: Y10T 29/49039 with dual gap materials
• CPC Class Codes: Y10T 29/49041 with significant slider/housing shaping or treating
• CPC Class Codes: Y10T 29/49043 Depositing magnetic layer or coating
• CPC Class Codes: Y10T 29/49046 with etching or machining of magnetic material
• CPC Class Codes: Y10T 29/49052 by etching

Abstract

A pedestal is formed over a first pole piece layer and insulator materials are formed to surround it. A gap layer made of a non-magnetic insulator or metal is then formed over the pedestal and the insulator, followed by the optional formation of a seed layer. A second pole piece is formed over the gap layer with or without the seed layer by forming a patterned resist using E-beam lithography and electroplating second pole piece materials within the patterned resist. After milling to remove side portions of the gap layer and the optional seed layer, a chemical etch is performed to remove a top portion of the insulator materials. The pedestal is then notched and trimmed by ion milling using the second pole piece as a mask to form a central notched structure. Since the second pole piece is precisely centered over the pedestal prior to notching, the pedestal is notched symmetrically to form a notched structure having side walls with angled slopes.

Claims

1. A method of making a magnetic head, comprising the acts of:

forming a pedestal over a first pole piece layer;

forming insulator materials to surround the pedestal;

depositing a gap layer over the pedestal and the insulator materials;

forming a second pole piece over the gap layer by;

forming a patterned resist for the second pole piece by exposing a portion of a resist to an electron beam and etching to remove the exposed portion;

electroplating second pole piece materials within the patterned resist;

etching the gap layer such that side portions of the gap layer are removed and a central portion remains between the second pole piece and the pedestal;

etching to remove at least top portions of the insulator materials which surround the pedestal; and

milling the pedestal, using the second pole piece as a mask, to form a central notched structure having side walls with angled slopes.

2. The method of claim 1, wherein the act of forming the second pole piece comprises electron beam (E-beam) lithography.

3. The method of claim 1, wherein the gap layer comprises a non-magnetic insulator.

4. The method of claim 1, wherein the gap layer comprises a non-magnetic metal.

5. The method of claim 1, wherein the gap layer comprises a non-magnetic metal selected from the group consisting of rhodium, tantalum/rhodium, chromium, and gold.

6. The method of claim 1, wherein the act of etching to remove the top portions of the insulator materials comprises performing a chemical etch.

7. The method of claim 1, wherein the gap layer comprises a non-magnetic metal and the act of etching to remove the top portions of the insulator materials comprises performing a chemical etch.

8. The method of claim 1, wherein the gap layer comprises a non-magnetic metal and the act of etching to remove the top portions of the insulator materials comprises performing a chemical etch which removes little if any of the gap layer.

9. The method of claim 1, further comprising:

forming a seed layer over the gap layer.

10. The method of claim 1, further comprising:

forming a seed layer over the gap layer; and

wherein the seed layer has a magnetic moment greater than or equal to that of the second pole piece.

11. The method of claim 1, further comprising:

forming a seed layer over the gap layer; and

etching the seed layer such that side portions of the seed layer are removed and a central portion remains between the second pole piece and the gap layer.

12. The method of claim 1, wherein the pedestal is centered with respect to the pedestal.

13. The method of claim 1, wherein the act of forming the pedestal comprises:

forming a patterned resist for the pedestal by exposing a portion of a resist to an electron beam and etching to remove the exposed portion; and

electroplating pedestal materials within the patterned resist.

14. A method of making a magnetic head, comprising:

electroplating a pedestal over a first pole piece layer;

forming insulator materials to surround the electroplated pedestal;

depositing a gap layer over the electroplated pedestal and the insulator materials, the gap layer comprising a non-magnetic metal;

forming a second pole piece over the gap layer by;

forming a patterned resist for the second pole piece by exposing a portion of a resist to an electron beam and etching to remove the exposed portion;

electroplating second pole piece materials within the patterned resist;

etching the gap layer such that side portions of the gap layer are removed and a central portion remains between the second pole piece and the electroplated pedestal;

performing a chemical-etch to remove at least top portions of the insulator; and

milling the electroplated pedestal, using the second pole piece as a mask, to form a central notched structure having side walls with angled slopes.

15. The method of claim 14, wherein the act of forming the second pole piece comprises electron beam (E-beam) lithography so that a precise centering between the second pole piece and the electroplated pedestal is achieved.

16. The method of claim 14, wherein the gap layer comprises a non-magnetic metal selected from the group consisting of rhodium, tantalum/rhodium, chromium, and gold.

17. The method of claim 14, wherein the act of performing the chemical etch removes little if any of the gap layer.

18. The method of claim 14, wherein the act of forming the patterned resist with use of the electron beam lithography comprises exposing a portion of a resist to an electron beam and etching to remove the exposed portion of the resist.

19. The method of claim 14, further comprising:

forming a seed layer over the gap layer.

20. The method of claim 14, further comprising:

forming a seed layer over the gap layer; and

etching the seed layer such that side portions of the seed layer are removed and a central portion remains between the second pole piece and the gap layer.

21. The method of claim 14, wherein the second pole piece is centered with respect to the electroplated pedestal.

22. A method of making a magnetic head comprising the acts of:

forming a pedestal over a first pole piece layer;

forming insulator materials to surround the pedestal;

forming a gap layer over the pedestal and the insulator materials;

depositing a seed layer over the gap layer;

forming a second pole piece over the seed layer by;

forming a patterned resist for the second pole piece by exposing a portion of a resist to an electron beam and etching to remove the exposed portion;

electroplating second pole piece materials within the patterned resist;

etching the seed layer such that side portions of the seed layer are removed and a central portion remains between the gap layer and the second pole piece;

etching the gap layer such that side portions of the gap layer are removed and a central portion remains between the seed layer and the pedestal;

performing a chemical etch to remove at least top portions of the insulator; and

ion milling the pedestal, using the second pole piece as a mask, to form a central notched structure having side walls with angled slopes.

23. The method of claim 22, wherein the gap layer comprises a non-magnetic insulator.

24. The method of claim 22, wherein the gap layer comprises a non-magnetic metal.

25. The method of claim 22, wherein the gap layer comprises a non-magnetic metal selected from the group consisting of rhodium, tantalum/rhodium, chromium, and gold.

26. The method of claim 22, further comprising:

performing a chemical-mechanical polishing (CMP) to form the insulator materials to surround the pedestal.

27. The method of claim 22, wherein the chemical etch removes little if any of the gap layer which comprises a non-magnetic metal.

28. The method of claim 22, wherein the central notched structure is formed to be symmetrical.

29. The method of claim 22, wherein the second pole piece is centered relative to the pedestal.

30. The method of claim 22, further comprising:

wherein the second pole piece is centered relative to the pedestal; and

wherein the central notched structure is formed to be symmetrical.