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Wet etching system

  • US 20050241760A1
  • Filed: 05/02/2005
  • Published: 11/03/2005
  • Est. Priority Date: 04/30/2004
  • Status: Abandoned Application
First Claim
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1. A wet etching system, comprising:

  • a substrate holding chamber;

    a drying chamber;

    a cleaning chamber;

    a wet etching region;

    an elevator; and

    a conveyor arranged above the drying chamber, the cleaning chamber, and the wet etching region, the conveyor communicating with both the substrate holding chamber and the elevator.

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