Lithographic apparatus and device manufacturing

• US 20050243295A1
• Filed: 04/30/2004
• Published: 11/03/2005
• Est. Priority Date: 04/30/2004
• Status: Abandoned Application

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: de Jager, Pieter Willem Herman, Gui, Cheng-Qun
• Application Number:
  US10/835,601
• Publication Number:
  US 20050243295A1
• Time in Patent Office: Days
• US Class Current: 355/55
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/70275 Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

Abstract

A lithographic apparatus and method project a patterned beam of radiation onto a substrate supported by a substrate table. The pattern is imparted to the beam using a patterning system. The patterned beam is projected onto a target portion of the substrate by a projection system. The projection system defines a pupil between the patterning system and the substrate table. A series of lens components are located between the pupil and the substrate table. The lens components comprise a beam expander, for expanding the beam from the pupil, and an array of lenses extending transversely relative to the beam such that each lens of the array focuses a respective portion of the projection beam onto a respective part of the target portion of the substrate. The position of at least one of the lens components is adjusted to adjust the magnification of the projection system.

Claims

1. A lithographic apparatus, comprising:

an illumination system that supplies a projection beam of radiation;

a patterning system that patterns the projection beam;

a substrate table that supports a substrate; and

a projection system that projects the patterned beam onto a target portion of the substrate and defines a pupil between the patterning system and the substrate table, the projection system comprising,

a series of lens components located between the pupil and the substrate table, the lens components comprising,

a beam expander that expands the patterned beam from the pupil, and

an array of lenses extending transversely relative to the patterned beam, such that each lens of the array of lenses focuses a respective portion of the patterned beam onto a respective part of the target portion of the substrate,

wherein a position of at least one of the lens components is adjustable relative to the pupil to adjust a magnification of the projection system.

2. The apparatus of claim 1, wherein at least one lens component of the beam expander is displaceable relative to the pupil and the array of lenses.

3. The apparatus of claim 1, wherein the array of lenses is displaceable relative to the pupil and the beam expander.

4. The apparatus of claim 1, wherein at least one lens component of the beam expander and the array of lenses are both displaceable relative to the pupil.

5. The apparatus of claim 1, wherein the beam expander generates a substantially parallel beam of radiation between itself and the array of lenses.

6. The apparatus of claim 1, wherein a single lens component of the beam expander is displaceable relative to the pupil.

7. An apparatus according to claim 1, wherein at least two lens components of the beam expander are displaceable relative to the pupil.

8. An apparatus according to claim 1, wherein a spacing between the array of lenses and at least one lens component of the beam expander is adjustable.

9. An apparatus according to claim 1, wherein an inclination of at least one lens component of the beam expander with respect to the patterned beam is adjustable.

10. An apparatus according to claim 1, wherein an inclination of the array of lenses with respect to the patterned beam is adjustable.

11. An apparatus according to claim 1, wherein the magnification is adjustable in a range of about Oppm to about 100 ppm.

12. A device manufacturing method, comprising:

forming individually controllable elements into an array of individually controllable elements;

using the array of individually controllable elements to impart a projection beam with a pattern;

projecting the patterned beam of radiation onto a target portion of a substrate through a projection system defining a pupil and comprising a series of lens components located between the pupil and a substrate table;

using a beam expander, which is part of the lens components, to expand the patterned beam from the pupil and a lens array extending transversely relative to the patterned beam;

focusing a respective part of the patterned beam using each lens in the lens array onto a respective part of the target portion of the substrate; and

adjusting a magnification of the projection system by adjusting a position of at least one of the lens components relative to the pupil.

13. The method of claim 12, further comprising displacing at least one lens component of the beam expander relative to the pupil and the lens array.

14. The method of claim 12, further comprising displacing the lens array relative to the pupil and the beam expander.

15. The method of claim 12, further comprising displacing at least one lens component of the beam expander and the lens array relative to the beam expander.

16. The method of claim 12, further comprising positioning the beam expander to generate a substantially parallel beam of radiation between itself and the lens array.

17. The method of claim 12, further comprising adjusting a position of a single lens component of the beam expander.

18. The method of claim 12, further comprising adjusting positions of at least two lens components of the beam expander.

19. The method of claim 12, further comprising adjusting a spacing between the beam expander and the lens array.

20. The method of claim 12, further comprising adjusting an inclination of the at least one component of the beam expander with respect to the projection beam.

21. The method of claim 12, further comprising adjusting an inclination of the lens array with respect to the projection beam.