Silica glass containing TiO2 and optical material for EUV lithography
First Claim
1. A silica glass containing Ti)2, characterized in that the fluctuation of the refractive index (Δ
- n) is at most 2×
10−
4 within an area of 30 mm×
30 mm in at least one plane.
2 Assignments
0 Petitions
Accused Products
Abstract
A silica glass containing TiO2, characterized in that the fluctuation of the refractive index (Δn) is at most 2×10−4 within an area of 30 mm×30 mm in at least one plane.
A silica glass containing TiO2, characterized in that the TiO2 concentration is at least 1 mass %, and the striae pitch is at most 10 μm.
An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, and the fluctuation of the refractive index (Δn) is at most 2×10−4 in a plane perpendicular to the incident light direction.
An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, wherein the TiO2 concentration is at least 1 mass %, and the difference between the maximum value and the minimum value of the TiO2 concentration is at most 0.06 mass % in a plane perpendicular to the incident light direction.
-
Citations
19 Claims
-
1. A silica glass containing Ti)2, characterized in that the fluctuation of the refractive index (Δ
- n) is at most 2×
10−
4 within an area of 30 mm×
30 mm in at least one plane. - View Dependent Claims (2, 6, 11, 12, 13)
- n) is at most 2×
-
3. A silica glass containing TiO2, characterized in that the TiO2 concentration is at least 1 mass %, and the difference between the maximum value and the minimum value of the TiO2 concentration is at most 0.06 mass % within an area of 30 mm×
- 30 mm in at least one plane.
- View Dependent Claims (4, 14, 15, 16, 18)
-
5. A silica glass containing TiO2, characterized in that the TiO2 concentration is at least 1 mass %, and the striae pitch is at most 10 μ
- m.
-
7. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, and the fluctuation of the refractive index (Δ
- n) is at most 2×
10−
4 in a plane perpendicular to the incident light direction. - View Dependent Claims (8, 17, 19)
- n) is at most 2×
- 9. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, wherein the TiO2 concentration is at least 1 mass %, and the difference between the maximum value and the minimum value of the TiO2 concentration is at most 0.06 mass % in a plane perpendicular to the incident light direction.
Specification