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Plasma uniformity control by gas diffuser hole design

  • US 20050251990A1
  • Filed: 07/12/2004
  • Published: 11/17/2005
  • Est. Priority Date: 05/12/2004
  • Status: Active Grant
First Claim
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1. A gas distribution plate assembly for a plasma processing chamber, comprising:

  • a diffuser plate element having an upstream side and a downstream side; and

    inner and outer gas passages passing between the upstream and downstream sides of the diffuser plate element and comprising hollow cathode cavities at the downstream side, wherein the hollow cathode cavity volume density of the inner gas passages is less than the hollow cathode cavity volume density of the outer gas passages.

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