Apparatus and a method for forming an alloy layer over a substrate

• US 20050252453A1
• Filed: 07/22/2005
• Published: 11/17/2005
• Est. Priority Date: 12/29/2000
• Status: Abandoned Application

• Current Assignee: Dan Gavish
• Original Assignee: Dan Gavish
• Inventors: Gavish, Dan
• Application Number:
  US11/188,068
• Publication Number:
  US 20050252453A1
• Time in Patent Office: Days
• US Class Current: 118/723.FI
• CPC Class Codes: C23C 16/047 using irradiation by energy or particles
• CPC Class Codes: C23C 16/06 characterised by the deposition of metallic material
• CPC Class Codes: C23C 16/16 from metal carbonyl compounds
• CPC Class Codes: C23C 16/486 using ion beam radiation
• CPC Class Codes: C23C 16/56 After-treatment
• CPC Class Codes: H01L 21/2855 by physical means, e.g. sputtering, evaporation H01L21/28518 - H01L21/28537 and H01L21/28568 take precedence
• CPC Class Codes: H01L 21/28556 by chemical means, e.g. CVD, LPCVD, PECVD, laser CVD H01L21/28518 - H01L21/28537 and H01L21/28568 take precedence
• CPC Class Codes: H01L 21/32051 Deposition of metallic or metal-silicide layers
• CPC Class Codes: H01L 21/76838 characterised by the formation and the after-treatment of the conductors etching for patterning the conductors H01L21/3213
• CPC Class Codes: H01L 21/76886 Modifying permanently or temporarily the pattern or the conductivity of conductive members, e.g. formation of alloys, reduction of contact resistances

Abstract

One embodiment of the invention involves introducing at least two metals into a chamber for forming an alloy layer over a substrate. This is accomplished by a variety of methods. In one embodiment, at least two metals are mixed and introduced into a chamber in which a focused ion beam contacts the two metals to form at least one alloy layer over a substrate. In another embodiment, at least two precursor gas sources are introduced into the chamber in which each precursor gas source contains a metal. The focused ion beam contacts the two precursor gases to form an alloy layer over the substrate. In yet another embodiment, a second metal layer is formed over a first metal layer to form a multi-metal layer. Thereafter, thermal treatment or introducing a focused ion beam to at least a portion of the multi-metal layer is performed to create at least one alloy layer over the substrate.

Claims

1. A machine readable storage medium containing executable program instructions which when executed cause a system to perform a method comprising:

controlling introduction of at least two metal constituents into a chamber;

controlling a formation of an alloy from the at least two metal constituents by controlling one of;

(1) introducing the at least two metal constituents into a chamber in which a focused ion beam contacts the two metal constituents to form a first alloy layer over a substrate;

(2) introducing at about the same time at least two precursor gas sources in which each precursor gas source contains a respective one of the at least two metal constituents and the focused ion beam contacts the at least two precursor gases to form a first alloy layer over the substrate, and

(3) forming a first layer of a first of the at least two metal constituents and a second layer of a second of the at least two metal constituents a multi-metal layer and performing one of thermal treatment and introducing focused ion beam to at least a portion of the multi-metal layer to form a first alloy layer over a substrate.

5. The method of claim 8, wherein the method further comprises:

an alloy process to the second alloy layer.

6. The machine readable storage medium of claim 10, wherein the alloy process is one of thermal treatment and applying a focused io

2. The machine readable storage medium of claim 6, the method further comprises:

forming more than one alloy layer, wherein a second alloy layer is formed over the first alloy layer.

3. The machine readable storage medium of claim 6, wherein the method further comprises:

controlling a formation of a second alloy layer over the substrate.

4. The machine readable storage medium of claim 6, wherein each of the at least two metal constituents is selected from the group consisting of cobalt, metal carbonyl, molybdenum, and tungsten.