Organic electronic device with improved hole injection
First Claim
1. An OLED device, comprising:
- a substrate;
an anode on said substrate;
a hole transport layer on said anode;
an intermixed layer on said hole transport layer;
an emissive layer on said intermixed layer; and
a cathode on said emissive layer, wherein at least one of;
(1) a HTL solution that dries to form said hole transport layer includes a first surfactant; and
(2) an EL solution that dries to form said emissive layer includes a second surfactant, and wherein said intermixed layer has a range of IPs between a highest IP of an adjacent layer on an anode-end and a lowest IP of an adjacent layer on an “
emissive layer”
-end.
6 Assignments
0 Petitions
Accused Products
Abstract
In a first embodiment of the present invention, in order to increase the number of holes injected into the emissive layer, an intermixed layer is formed from the intermixing of the hole transport layer (“HTL”) and the emissive layer. The intermixed layer is between the HTL and the emissive layer of the OLED device. Alternatively, in a second embodiment of the present invention, in order to increase the number of holes injected into the emissive layer, a separate interlayer is incorporated within the OLED device. The interlayer is comprised of a hole transport material in which one of its components is at least partially replaced with one of the components of the emissive layer that is responsible for hole injection and transport. The separate interlayer is between the anode and the emissive layer of the OLED device. One or more intermediate layers may be present between the interlayer and the anode such as, for example, a HTL may be present between those two layers.
25 Citations
47 Claims
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1. An OLED device, comprising:
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a substrate;
an anode on said substrate;
a hole transport layer on said anode;
an intermixed layer on said hole transport layer;
an emissive layer on said intermixed layer; and
a cathode on said emissive layer, wherein at least one of;
(1) a HTL solution that dries to form said hole transport layer includes a first surfactant; and
(2) an EL solution that dries to form said emissive layer includes a second surfactant, andwherein said intermixed layer has a range of IPs between a highest IP of an adjacent layer on an anode-end and a lowest IP of an adjacent layer on an “
emissive layer”
-end. - View Dependent Claims (2, 3, 4, 5)
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6. A method to fabricate an OLED device, comprising:
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forming an anode on a substrate;
adding at least one of;
(1) a first surfactant to a HTL solution, and (2) a second surfactant to an EL solution;
forming a hole transport layer on said anode by depositing said HTL solution on said anode and allowing said HTL solution to dry;
depositing said EL solution on said hole transport layer, a portion of said EL solution dissolves a portion of said hole transport layer producing an intermixed solution; and
allowing said intermixed solution and said EL solution to dry to form;
(1) an intermixed layer on said hole transport layer and (2) an emissive layer on said intermixed layer,wherein said intermixed layer has a range of IPs between a highest IP of an adjacent layer on an anode-end and a lowest IP of an adjacent layer on an “
emissive layer”
-end. - View Dependent Claims (7, 8, 9, 10, 11)
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12. An OLED device, comprising:
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a substrate;
an anode on said substrate;
a hole transport layer on said anode;
an intermixed layer on said hole transport layer;
an emissive layer on said intermixed layer; and
a cathode on said emissive layer, wherein said hole transport layer includes a plurality of first components, said intermixed layer includes a plurality of second components, and said emissive layer includes a plurality of third components, and wherein one of said plurality of first components is a particular one of said plurality of second components and a particular one of said plurality of third components, wherein said intermixed layer has a range of IPs between a highest IP of an adjacent layer on an anode-end and a lowest IP of an adjacent layer on an “
emissive layer”
-end. - View Dependent Claims (13, 14)
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15. A method to fabricate an OLED device, comprising:
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forming an anode on a substrate;
adding a particular one of a plurality of first components of a HTL solution to an EL solution so that it is one of a plurality of second components of said EL solution;
forming a hole transport layer on said anode;
depositing said EL solution on said hole transport layer, a portion of said EL solution dissolves a portion of said hole transport layer producing an intermixed solution; and
allowing said intermixed solution and said EL solution to dry to form;
(1) an intermixed layer on said hole transport layer, and (2) an emissive layer on said intermixed layer,wherein said intermixed layer has a range of IPs between a highest IP of an adjacent layer on an anode-end and a lowest IP of an adjacent layer on an “
emissive layer”
-end. - View Dependent Claims (16, 17, 18, 19)
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20. An OLED device, comprising:
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a substrate;
an anode on said substrate;
a hole transport layer on said anode;
an intermixed layer on said hole transport layer;
an emissive layer on said intermixed layer; and
a cathode on said emissive layer, wherein said hole transport layer is formed from a HTL solution that includes a first non-aqueous solvent, and said emissive layer is formed from an EL solution that includes a second non-aqueous solvent, and said intermixed layer is formed from an intermixed solution resulting from a portion of said EL solution dissolving a portion of said hole transport layer, and wherein said intermixed layer has a range of IPs between a highest IP of an adjacent layer on an anode-end and a lowest IP of an adjacent layer on an “
emissive layer”
-end. - View Dependent Claims (21, 22, 23, 24)
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25. A method to fabricate an OLED device, comprising:
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forming an anode on a substrate;
depositing a HTL solution on said anode, said HTL solution includes a first non-aqueous solvent;
allowing said HTL solution to dry to form a hole transport layer;
depositing an EL solution on said hole transport layer, said EL solution includes a second non-aqueous solvent, wherein a portion of said EL solution dissolves a portion of said hole transport layer resulting in an intermixed solution; and
allowing said intermixed solution and said EL solution to dry to form;
(1) an intermixed layer on said hole transport layer, and (2) an emissive layer on said intermixed layer,wherein said intermixed layer has a range of IPs between a highest IP of an adjacent layer on an anode-end and a lowest IP of an adjacent layer on an “
emissive layer”
-end. - View Dependent Claims (26, 27, 28)
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29. An OLED device, comprising:
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a substrate;
an anode on said substrate;
a hole transport layer on said anode;
an intermixed layer on said hole transport layer;
an emissive layer on said intermixed layer; and
a cathode on said emissive layer, wherein after said hole transport layer, said intermixed layer, and said emissive layer are formed, said layers are baked to increase an amount of intermixing between said hole transport layer and said emissive layer, and wherein said intermixed layer has a range of IPs between a highest IP of an adjacent layer on an anode-end and a lowest IP of an adjacent layer on an “
emissive layer”
-end. - View Dependent Claims (30, 31, 32)
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33. A method to fabricate an OLED device, comprising:
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forming an anode on a substrate;
depositing a HTL solution on said anode;
allowing said HTL solution to dry to form a hole transport layer;
depositing an EL solution on said hole transport layer, a portion of said EL solution dissolves a portion of said hole transport layer producing an intermixed solution;
allowing said intermixed solution and said EL solution to dry to form;
(1) an intermixed layer on said hole transport layer, and (2) an emissive layer on said intermixed layer; and
after said intermixed solution and said EL solution are allowed to dry, baking said hole transport layer, said intermixed layer, and said emissive layer to increase an amount of intermixing between the hole transport layer and the emissive layer, wherein said intermixed layer has a range of IPs between a highest IP of an adjacent layer on an anode-end and a lowest IP of an adjacent layer on an “
emissive layer”
-end. - View Dependent Claims (34, 35)
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36. An OLED device, comprising:
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a substrate;
an anode on said substrate;
an interlayer on said anode;
an emissive layer on said interlayer, wherein said emissive layer includes a plurality of first components, a particular one of said plurality of first components is responsible for hole injection and transport; and
a cathode on said emissive layer, wherein said interlayer includes a plurality of second components and a particular one of said plurality of second components is said particular one of said plurality of first components that is responsible for hole injection and transport, and wherein said interlayer has a range of IPs between a highest IP of an adjacent layer on an anode-end and a lowest IP of an adjacent layer on an “
emissive layer”
-end. - View Dependent Claims (37, 38, 39, 40, 41)
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42. A method to fabricate an OLED device, comprising:
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forming an anode on a substrate;
forming an interlayer on said anode;
forming an emissive layer on said interlayer, wherein said emissive layer includes a plurality of first components, a particular one of said plurality of first components is responsible for hole injection and transport;
forming a cathode on said emissive layer, wherein said interlayer includes a plurality of second components, a particular one of said plurality of second components is said particular one of said plurality of first components that is responsible for hole injection and transport, and wherein said interlayer has a range of IPs between a highest IP of an adjacent layer on an anode-end and a lowest IP of an adjacent layer on an “
emissive layer”
-end. - View Dependent Claims (43, 44, 45, 46, 47)
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Specification