Method for optimizing the image properties of at least two optical elements as well as methods for optimizing the image properties of at least three optical elements

• US 20050254042A1
• Filed: 07/22/2005
• Published: 11/17/2005
• Est. Priority Date: 09/21/2001
• Status: Active Grant

• Current Assignee: Carl Zeiss AG (Carl-Zeiss-Stiftung)
• Original Assignee: Carl Zeiss AG (Carl-Zeiss-Stiftung)
• Inventors: Stenkamp, Dirk, Geh, Bernd, Graupner, Paul, Stammler, Thomas, Stuhler, Jochen, Wurmbrand, Klaus
• Granted Patent: US 7,301,622 B2
• Time in Patent Office: Days
• US Class Current: 356/124
• CPC Class Codes: G01M 11/0207 Details of measuring devices
• CPC Class Codes: G01M 11/0242 by measuring geometrical properties or aberrations
• CPC Class Codes: G01M 11/0257 by analyzing the image formed by the object to be tested
• CPC Class Codes: G02B 27/0012 Optical design, e.g. procedures, algorithms, optimisation routines
• CPC Class Codes: G03F 7/70225 Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
• CPC Class Codes: G03F 7/70258 Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
• CPC Class Codes: G03F 7/706 Aberration measurement
• CPC Class Codes: G03F 7/70666 Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system

Abstract

In order to optimize the image properties of several optical elements of which at least one is moved relative to at least one stationary optical element, the overall image defect resulting from the interaction of all optical elements is first of all measured. This is represented as a linear combination of the base functions of an orthogonal function set. The movable element is then moved to a new measurement position and the overall image defect is measured once again. After the linear combination representation of the new overall image defect, the image defects of the movable element and of the stationary element are calculated from the data thereby obtained. With only one movable optical element a target position in which the overall image defect is minimized can be directly calculated and adjusted there from. If several movable optical elements are available, methods are given for the efficient determination of the respective target position.

Claims

1. A measurement system for determining an image defect of at least one of at least two optical elements of an optical system, comprising:

a) measuring means for measuring

a first image defect of the optical system in a first relative position of the at least two optical elements and

a second image defect of the optical system in a second relative position of the at least two optical elements, said second relative position being distinct from the first relative position, and

b) computing means that

represent the first image defect as a first linear combination of base functions of an orthogonal function set,

represent the second image defect as a second linear combination of the base functions of the orthogonal function set and

calculate the image defect of at least one of the at least two optical elements using the first linear combination and the second linear combination.

2. The measurement system of claim 1, comprising driving means for changing the relative position of the at least two optical elements.

3. The measurement system of claim 2, wherein the driving means are configured to rotate at least one of the at least two optical elements about an optical axis of the optical system.

4. The measurement system of claim 1, wherein the measuring means use air image data for measuring the first and the second image defect.

5. The measurement system of claim 1, wherein the Zernike functions are chosen as orthogonal function set.

6. The measurement system of claim 1, wherein one of the at least two optical elements is stationary.

7. A projection exposure apparatus, comprising the measurement system of claim 1, wherein the optical system is an objective lens system.

8. The apparatus of claim 7, wherein the measuring means measure wave front data of an imaging light bundle at the image side of the projection objective lens system.

9. A correction system for reducing an image defect of an optical system, wherein the optical system comprises at least two optical elements, said correction system comprising:

a) measuring means for measuring

a first image defect of the optical system in a first relative position of the at least two optical elements and

a second image defect of the optical system in a second relative position of the at least two optical elements, said second relative relating being distinct from the first relative position, and

b) computing means that

represent the first image defect as a first linear combination of base functions of an orthogonal function set,

represent the second measured image defect as a second linear combination of the base functions of the orthogonal function set and

calculate a target position for the at least two optical elements based on the first linear combination and the second linear combination so as to reduce the image defect.

10. The correction system of claim 9, comprising driving means for changing the relative position of the at least two optical elements.

11. The correction system of claim 10, wherein the driving means are configured to rotate at least one of the at least two optical elements about an optical axis of the optical system.

12. The correction system of claim 9, wherein the measuring means use air image data for measuring the first and the second image defect.

13. The correction system of claim 9, wherein one of the at least two optical elements is stationary.

14. The correction system of claim 9, wherein the Zernike functions are chosen as orthogonal function set.

15. A projection exposure apparatus, comprising the measurement system of claim 9, wherein the optical system is an objective lens system.

16. The apparatus of claim 15, wherein the measuring means measure wave front data of an imaging light bundle at the image side of the projection objective lens system.

17. A method for determining a first imaging defect of an optical system comprising at least two optical elements whose relative position with respect to each other can be changed, the method comprising the following steps:

a) determining a second imaging defect for a first relative position of the at least two optical elements;

b) determining a third imaging defect for a first relative position of the at least two optical elements;

c) determining the first imaging defect by comparing the first imaging defect to the third imaging defect.

18. A determining system for determining image defects of an optical system, wherein the optical system comprises at least two optical elements, said determining system comprising:

a) means for determining a first imaging defect for a first relative position of the at least two optical elements;

b) means for determining a second imaging defect for a second relative position of the at least two optical elements;

c) means for determining a third imaging defect by comparing the first imaging defect to the third imaging defect.