Apparatus and methods for curing ink on a substrate using an electron beam
First Claim
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1. A method of curing ink on a substrate comprising:
- placing a substrate on a support stage of an ink curing chamber; and
scanning an electron beam over a surface of the substrate within the ink curing chamber so as to cure ink present on the substrate.
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Abstract
In a first aspect, a method of curing ink on a substrate is provided. The method includes the steps of (1) placing a substrate on a support stage of an ink curing chamber; and (2) scanning an electron beam over a surface of the substrate within the ink curing chamber so as to cure ink present on the substrate. Numerous other aspects are provided.
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Citations
25 Claims
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1. A method of curing ink on a substrate comprising:
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placing a substrate on a support stage of an ink curing chamber; and
scanning an electron beam over a surface of the substrate within the ink curing chamber so as to cure ink present on the substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. An apparatus for curing ink, comprising:
a chamber having;
an electron beam emitter adapted to emit an electron beam; and
an electron beam emitter positioning device, wherein the electron beam emitter positioning device is adapted to support the electron beam emitter at a distance above a surface of a substrate containing ink and move the electron beam emitter so as to scan an electron beam over the surface of the substrate and cure ink present on the substrate. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24)
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25. An apparatus for curing ink, comprising:
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a chamber having;
an electron beam emitter adapted to emit an electron beam;
an electron beam emitter positioning device, wherein the electron beam emitter positioning device is adapted to support the electron beam emitter at a distance above a surface of a substrate containing ink and move the electron beam emitter so as to scan an electron beam over the surface of the substrate and cure ink present on the substrate. an ozone detector adapted to detect a level of ozone in the ink curing chamber;
a controller coupled to the ozone detector and adapted to receive a signal from the ozone detector, determine if the level of ozone is above a predetermined level, and if so activate at least one of purging the ink curing chamber and turning off the electron beam;
an x-ray detector coupled to the controller and adapted to detect a level of x-ray leakage from the ink curing chamber, wherein the controller is adapted to receive a signal from the x-ray detector, determine if the level of x-ray leakage is above a predetermined level, and if so initiate turning off the electron beam;
an interlock system coupled to the controller and adapted to detect an open or unlocked condition of a door of the ink curing chamber, wherein the controller is adapted to receive a signal indicating whether the door of the ink curing chamber is open or unlocked and, if so, initiate turning off the electron beam; and
a purging system coupled to the controller and adapted to purge the ink curing chamber with an inert gas in response to an activation signal from the controller, wherein the electron beam emitter positioning device is adapted to remain at a constant z-axis position during substrate load/unload operations, wherein the apparatus further includes a stage adapted to support the substrate, and wherein the stage is adapted to be lowered so as to allow stationary lift pins to protrude through the stage, support the substrate, and provide clearance above and below the substrate when the stage is lowered.
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Specification