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Plasma processing apparatus

  • US 20050257891A1
  • Filed: 03/13/2003
  • Published: 11/24/2005
  • Est. Priority Date: 03/20/2002
  • Status: Abandoned Application
First Claim
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1. A plasma processing apparatus comprising:

  • an electromagnetic wave source;

    one of a waveguide or a coaxial transmission line for transmitting an electromagnetic wave from said electromagnetic wave source;

    a vacuum container operatively coupled to said waveguide or coaxial transmission line to expose said electromagnetic wave to a dielectric space and in which a plasma generated by said electromagnetic wave radiated within said vacuum container; and

    scattering means for scattering the electromagnetic wave radiated within said dielectric space.

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